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SiOnyx, LLC, et al v. Hamamatsu Photonics K.K., et al NPE DC CAFC
- 1:15-cv-13488
- D. Mass.
- Judge: F. Dennis Saylor, IV
+1
- Filed: 10/01/2015
- Closed: 05/18/2021
- Latest Docket Entry: 10/29/2021
- PACER
2
Plaintiffs
3
Defendants
20
Accused
Products
3
Patents-in-Suit
2,057
Days in
Litigation
-
SiOnyx, LLC, et al v. Hamamatsu Photonics K.K., et al NPE DC CAFC
- 1:15-cv-13488
- D. Mass.
- Judge: F. Dennis Saylor, IV
+1
- Filed: 10/01/2015
- Closed: 05/18/2021
- Latest Docket Entry: 10/29/2021
- PACER
Causes of Action
Breach of Contract
Other
Willful Patent Infringement
Declaratory Judgment
Assigned Judge
Outcome Summary
Patent Information
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Validity & Enforceability
| Claim # | Claim Text | Outcome |
|---|---|---|
| 1 |
A method of fabricating a semiconductor wafer, comprising: irradiating one or more surface locations of a silicon substrate with a plurality of temporally short laser pulses while exposing said one or more locations to a substance so as to generate a
view more
|
Valid
Entry 751 |
| 2 |
The method of claim 1, wherein said charge carriers comprise electrons.
|
Valid
Entry 751 |
| 3 |
The method of claim 1, wherein said charge carriers comprise holes.
|
Valid
Entry 751 |
-
Infringement
Hamamatsu Photonics KK
- 1 Detail
| Accused Product | Patent # | Claim # | Outcome |
|---|---|---|---|
| C11008MAC11010MAC5964-0901C5964-1011C8484-03C9405CBC9408MAC9410MAImage sensors with silicon dieOcean Optics Maya2000 Pro-NIR spectrometerS11499S11499-01 image sensorS11500-1007S11510-1006S11510-1106S11518-10S11518-30S11519-10S11519-30S12028 | US 8,080,467 B2 | All Asserted Claims |
Willful infringement
Entry 865Entry 834 Entry 751 |
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Damages