Demaray Sues Intel and Samsung over Magnetron Sputtering Patents

  • July 15, 2020
  • Category: New Patent Litigation
    Market Sector: Semiconductors

Inventor-controlled Demaray LLC has sued Intel (6:20-cv-00634) and Samsung (6:20-cv-00636) in the Western District of Texas over the configuration and use of certain semiconductor manufacturing equipment, including reactive magnetron sputtering reactors. The plaintiff asserts two related patents, each naming R. Ernest Demaray as an inventor and generally related to magnetron sputtering, which is a form of physical vapor deposition (PVD) that uses magnetic and electrical fields for thin-layer deposition. The new complaints highlight the use by each defendant of reactors in the Endura product line of Applied Materials to deposit metal nitride layers as part of the fabrication process for certain semiconductor products.


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