A jury in the Eastern District of Texas has issued an infringement verdict for a US-based subsidiary of the Korea Advanced Institute of Science and Technology (KAIST), a South Korean state-run research university. On June 15, the jury found that Samsung had infringed a single KAIST patent through the provision of semiconductor products utilizing FinFET technology, also finding GlobalFoundries and Qualcomm to infringe through the provision of chips and devices that incorporate FinFET architectures. The verdict included a finding of willfulness as to Samsung and awarded $400M in damages against that defendant.