Insulating glass unit transparent conductivity and low emissivity coating technology
First Claim
1. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the coating formed by an optional base film, a flash-treated indium tin oxide film, and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film is formed of silicon nitride, silicon oxynitride, or silicon dioxide, the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide being in contact with the flash-treated indium tin oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide is an outermost film, the flash-treated indium tin oxide film having a thickness of between 1,050 Å
- and 1,450 Å
, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of less than 3 nm, the flash-treated indium tin oxide film having a sheet resistance of greater than 10 Ω
/square but less than 15 Ω
/square in combination with said coated glass pane having a monolithic visible transmittance of greater than 0.86 but less than 0.92, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, and the flash-treated indium tin oxide film having a carrier concentration of 9−
13 ×
1020/cm3, the multiple-pane insulating glazing unit including an internal pane surface bearing a low-emissivity coating that has only one film comprising silver, the film comprising silver containing at least 50% silver by weight, the low-emissivity coating being exposed to the between-pane space, the multiple-pane insulating glazing unit having a U value of less than 0.25 together with an IGU visible transmission of greater than 75%.
1 Assignment
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Accused Products
Abstract
The invention provides flash-treated transparent conductive coatings based on indium tin oxide. Some embodiments provide a multiple-pane insulating glazing unit that includes two glass panes and a between-pane space. The two glass panes respectively define two opposed external pane surfaces. At least one of the two external pane surfaces has a flash-treated transparent conductive oxide coating.
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Citations
21 Claims
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1. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the coating formed by an optional base film, a flash-treated indium tin oxide film, and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film is formed of silicon nitride, silicon oxynitride, or silicon dioxide, the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide being in contact with the flash-treated indium tin oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide is an outermost film, the flash-treated indium tin oxide film having a thickness of between 1,050 Å
- and 1,450 Å
, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of less than 3 nm, the flash-treated indium tin oxide film having a sheet resistance of greater than 10 Ω
/square but less than 15 Ω
/square in combination with said coated glass pane having a monolithic visible transmittance of greater than 0.86 but less than 0.92, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, and the flash-treated indium tin oxide film having a carrier concentration of 9−
13 ×
1020/cm3, the multiple-pane insulating glazing unit including an internal pane surface bearing a low-emissivity coating that has only one film comprising silver, the film comprising silver containing at least 50% silver by weight, the low-emissivity coating being exposed to the between-pane space, the multiple-pane insulating glazing unit having a U value of less than 0.25 together with an IGU visible transmission of greater than 75%. - View Dependent Claims (2, 3, 4, 5, 16, 19)
- and 1,450 Å
-
6. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the coating formed by an optional base film, a flash-treated indium tin oxide film and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film is formed of silicon nitride, silicon oxynitride, or silicon dioxide, the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide being in contact with the flash-treated indium tin oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide is an outermost film, the flash-treated indium tin oxide film having a thickness of between 1,050 Å
- and 1,450 Å
, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of less than 3 nm, the flash-treated indium tin oxide film having a sheet resistance of greater than 10 Ω
/square but less than 15 Ω
/square in combination with said desired glass pane having a monolithic visible transmittance of greater than 0.86 but less than 0.92, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, and the flash-treated indium tin oxide film having a carrier concentration of 9−
13 ×
1020/cm3, wherein the multiple-pane insulating glazing unit includes an internal pane surface bearing a low-emissivity coating that has only two films comprising silver, each of the two films comprising silver containing at least 50% silver by weight, the low-emissivity coating being exposed to the between-pane space, the multiple-pane insulating glazing unit having a U value of less than 0.25 together with an IGU visible transmission of greater than 65%. - View Dependent Claims (7, 8, 9, 10, 17, 20)
- and 1,450 Å
-
11. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the coating formed by an optional base film, a flash-treated indium tin oxide film and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film is formed of silicon nitride, silicon oxynitride, or silicon dioxide, the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide being in contact with the flash-treated indium tin oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film formed of silicon nitride, silicon oxynitride, or silicon dioxide is an outermost film, the flash-treated indium tin oxide film having a thickness of between 1,050 Å
- and 1,450 Å
, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of less than 3 nm, the flash-treated indium tin oxide film having a sheet resistance of greater than 10 Ω
/square but less than 15 Ω
/square in combination with said coated glass pane having a monolithic visible transmittance of greater than 0.86 but less than 0.92, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, and the flash-treated indium tin oxide film having a carrier concentration of 9−
13 ×
1020/cm3, wherein the multiple-pane insulating glazing unit includes an internal pane surface bearing a low-emissivity coating that includes three films comprising silver, each of the films comprising silver containing at least 50% silver by weight, the low-emissivity coating being exposed to the between-pane space, the multiple-pane insulating glazing unit having a U value of less than 0.25 together with an IGU visible transmission of greater than 60%. - View Dependent Claims (12, 13, 14, 15, 18, 21)
- and 1,450 Å
Specification