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3D semiconductor structure and device

  • US 10,002,865 B2
  • Filed: 04/08/2017
  • Issued: 06/19/2018
  • Est. Priority Date: 03/12/2013
  • Status: Active Grant
First Claim
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1. A 3D structure, the structure comprising:

  • a first stratum overlaid by a second stratum, said second stratum is less than two microns thick,wherein said first stratum comprises an array of memory cells comprising at least four rows of memory cells, each of said rows is controlled by a bit-line,wherein said array of memory cells comprises a plurality of columns of memory cells, each of said columns is controlled by a word-line,wherein said second stratum comprises memory control circuits directly connected to said bit-lines and said word-lines,wherein said second stratum comprises a first layer comprising first transistors and a second layer comprising second transistors,wherein said first layer comprises a first bus, said first bus interconnecting a plurality of first logic units,wherein said second layer comprises a second bus, said second bus interconnecting a plurality of second logic units, andwherein said first bus and said second bus are interconnected so said second logic units could communicate through said first bus with at least one of said first logic units.

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