Liquid crystal display device and touch panel
First Claim
1. A method for manufacturing a liquid crystal display device comprising the steps of:
- forming a transistor over a first substrate, the transistor comprising an oxide semiconductor film which includes a channel formation region;
forming an insulating film over the transistor;
forming a pixel electrode over the insulating film, the pixel electrode being in electrical contact with the transistor;
heating the first substrate and a second substrate to perform dry treatment after forming the pixel electrode;
dropping a liquid crystal material on the second substrate after heating the second substrate; and
bonding the first substrate and the second substrate with each other with the liquid crystal material interposed therebetween,wherein the steps of heating the first substrate and the second substrate, and dropping the liquid crystal material are successively performed without exposure to air.
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Accused Products
Abstract
To provide a highly reliable liquid crystal display device including flexible substrates and a crystalline oxide semiconductor film for a backplane. The device includes a flexible first substrate, a flexible second substrate facing the first substrate, and a liquid crystal layer sealed between the substrates with a sealing member. The first substrate is provided with a layer including a transistor, an organic resin film over the transistor, a pixel electrode and a common electrode over the organic resin film, which partly overlap with each other with an insulating film provided therebetween, and an alignment film thereover. The transistor includes a crystalline oxide semiconductor film as a semiconductor layer where a channel is formed. Drying treatment is performed on the layer before the liquid crystal layer is sealed between the substrates, and steps from the drying treatment to sealing of the liquid crystal layer are performed without exposure to the air.
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Citations
24 Claims
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1. A method for manufacturing a liquid crystal display device comprising the steps of:
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forming a transistor over a first substrate, the transistor comprising an oxide semiconductor film which includes a channel formation region; forming an insulating film over the transistor; forming a pixel electrode over the insulating film, the pixel electrode being in electrical contact with the transistor; heating the first substrate and a second substrate to perform dry treatment after forming the pixel electrode; dropping a liquid crystal material on the second substrate after heating the second substrate; and bonding the first substrate and the second substrate with each other with the liquid crystal material interposed therebetween, wherein the steps of heating the first substrate and the second substrate, and dropping the liquid crystal material are successively performed without exposure to air. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for manufacturing a liquid crystal display device comprising the steps of:
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forming a transistor over a first substrate, the transistor comprising an oxide semiconductor film which includes a channel formation region; forming an insulating film over the transistor; forming a pixel electrode over the insulating film, the pixel electrode being in electrical contact with the transistor; heating the first substrate and a second substrate under reduced pressure to perform dry treatment after forming the pixel electrode; dropping a liquid crystal material on the second substrate after heating the second substrate; and bonding the first substrate and the second substrate with each other with the liquid crystal material interposed therebetween, wherein the steps of heating the first substrate and the second substrate, and dropping the liquid crystal material are successively performed without exposure to air. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A method for manufacturing a liquid crystal display device comprising the steps of:
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forming a transistor over a first substrate, the transistor comprising an oxide semiconductor film which includes a channel formation region; forming an insulating film over the transistor; forming a pixel electrode over the insulating film, the pixel electrode being in electrical contact with the transistor; heating the first substrate to perform dry treatment after forming the pixel electrode; heating a second substrate to perform dry treatment; dropping a liquid crystal material on the second substrate after heating the second substrate; and bonding the first substrate and the second substrate with each other with the liquid crystal material interposed therebetween, wherein the steps of heating the first substrate and the second substrate, and dropping the liquid crystal material are successively performed without exposure to air. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
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Specification