Method for computer modeling and simulation of negative-tone-developable photoresists

• US 10,007,191 B2
• Filed: 08/09/2016
• Issued: 06/26/2018
• Est. Priority Date: 07/15/2016
• Status: Active Grant

• Current Assignee: KLA-Tencor Corporation (KLA Corporation)
• Original Assignee: KLA-Tencor Corporation (KLA Corporation)
• Inventors: Biafore, John J., Smith, Mark D., Graves, John S., Blankenship, David A., Vaglio Pret, Alessandro
• Primary Examiner(s): Kreutzer, Colin
• Application Number:
  US15/232,302
• Publication Number:
  US 20180017873A1
• Time in Patent Office: 686 Days
• Field of Search: 355 27, 355 67, 355 71, 355 77, 430311, 430434, 703 12, 716 50- 54
• CPC Class Codes: G03F 7/30 Imagewise removal using liquid means
• CPC Class Codes: G03F 7/322 Aqueous alkaline compositions
• CPC Class Codes: G03F 7/325 Non-aqueous compositions
• CPC Class Codes: G03F 7/38 Treatment before imagewise removal, e.g. prebaking G03F7/265 takes precedence
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Abstract

In some embodiments, a method may include improving a development process of a photoresist. The method may include simulating a negative-tone development process of a photoresist. The method may include determining a reaction of a developer with a soluble photoresist surface. Determining the reaction of the developer may include applying a reaction rate constant at a power of a reaction order to a blocked polymer concentration to yield a resist dissolution rate of soluble resist comprising the dissolution-limited regime of development. The method may include determining a flux of the developer into exposed and partially soluble resist. Determining the flux of the developer may include applying a vector valued diffusion coefficient of the developer dependent upon the blocked polymer concentration to a gradient of developer concentration to an expansion rate of insoluble resist comprising the expansion-controlled regime of development. The method may include optimizing an illumination source and a mask on a full chip.

Claims

1. A method of optimizing a mask, comprising:

simulating a development process of a photoresist, comprising;

determining a reaction of a developer with a soluble photoresist surface comprising;

applying a reaction rate constant at a power of a reaction order to a blocked polymer concentration to yield a resist dissolution rate of soluble resist comprising a dissolution-limited regime of development; and

determining a flux of the developer into exposed and partially soluble resist comprising;

applying a vector valued diffusion coefficient of the developer dependent upon the blocked polymer concentration to a gradient of developer concentration to an expansion rate of insoluble resist comprising a expansion-controlled regime of development;

providing a result from the simulation for use in optimizing and forming a mask.

2. The method of claim 1, wherein the development process of photoresists comprises a negative-tone development process.

3. The method of claim 1, wherein the development process of photoresists comprises a positive-tone development process.

4. The method of claim 1, wherein the development process of photoresists comprises photoresists used for 248 nm (KrF), 193 nm (ArF) or 13.5 nm (EUV) lithography.

5. The method of claim 1, wherein applying the reaction rate constant (k_R) to the blocked polymer concentration (m)k_R(m)ⁿ at the power of the reaction order (n) to the dissolution rate of soluble resist (R_D) is equivalent to k_R(m)ⁿ.

6. The method of claim 1, wherein determining a flux (j_S(r,t)) of the developer into exposed and partially soluble resist is determined by applying a vector-valued diffusion coefficient (D_S) of the developer dependent upon the blocked polymer concentration (m) is applied to a gradient of the developer concentration (∇

S) at a point r and time t such that

j_S(r,t)=−

D_S(m)∇

S(r,t).

7. The method of claim 1, wherein the dissolution-controlled regime applies when the photoresist surface is at least partially soluble to the developer.

8. The method of claim 1, wherein the expansion-controlled regime applies when the photoresist surface is substantially insoluble to the developer.

9. The method of claim 1, wherein the expansion-controlled regime applies when the photoresist surface is substantially insoluble to the developer such that the developer continues to absorb into the photoresist increasing the volume of the photoresist.

10. The method of claim 1, wherein the dissolution-controlled regime is transitioned to the expansion-controlled regime at a gel point dose.

11. The method of claim 1, wherein the method of simulating the development process of photoresists comprises stochastically simulating the development process of photoresists.

12. The method of claim 1, further comprising correcting the optical proximity of the mask on a full chip.

13. The method of claim 1, further comprising placing and verifying of the mask sub-resolution assist feature on a full chip.

14. The method of claim 1, further comprising repairing the mask sub-resolution assist feature.

15. The method of claim 1, further comprising inspecting the mask on a full chip.

16. The method of claim 1, further comprising identifying, diagnosing, and/or repairing the mask hot-spot on a full chip.

17. The method of claim 1, further comprising optimizing an illumination source on a full chip.

18. A method of forming an integrated circuit, comprising:

simulating a negative-tone development process of a photoresist, comprising;

determining a reaction of a developer with a photoresist surface comprising;

applying a reaction rate constant at a power of a reaction order to a blocked polymer concentration to yield a resist dissolution rate of soluble resist comprising the dissolution-limited regime of development; and

determining a flux of the developer into exposed and partially soluble resist comprising;

applying a vector valued diffusion coefficient of the developer dependent upon the blocked polymer concentration to a gradient of developer concentration to an expansion rate of insoluble resist comprising the expansion-controlled regime of development; and

optimizing an illumination source and a mask on a full chip using a result from the simulation.

19. The method of claim 18, further comprising forming an integrated circuit using an optimized illumination source and mask on a full chip.

20. The method of claim 18, wherein the development process of photoresists comprises a negative-tone development process.

21. The method of claim 18, wherein the development process of photoresists comprises a positive-tone development process.

22. The method of claim 18, wherein the development process of photoresists comprises photoresists used for 248 nm (KrF), 193 nm (ArF) or 13.5 nm (EUV) lithography.

23. The method of claim 18, wherein applying the reaction rate constant (k_R) to the blocked polymer concentration (m)k_R(m)ⁿ at the power of the reaction order (n) to the dissolution rate of soluble resist (R_D) is equivalent to k_R(m)ⁿ.

24. The method of claim 18, wherein determining a flux (j_S(r,t)) of the developer into exposed and partially soluble resist is determined by applying a vector-valued diffusion coefficient (D_S) of the developer dependent upon the blocked polymer concentration (m) is applied to a gradient of the developer concentration (∇

S) at a point r and time t such that

j_S(r,t)=−

D_S(m)∇

S(r,t).

25. The method of claim 18, wherein the dissolution-controlled regime applies when the photoresist surface is at least partially soluble to the developer.

26. The method of claim 18, wherein the expansion-controlled regime applies when the photoresist surface is substantially insoluble to the developer.

27. The method of claim 18, wherein the expansion-controlled regime applies when the photoresist surface is substantially insoluble to the developer such that the developer continues to absorb into the photoresist increasing the volume of the photoresist.

28. The method of claim 18, wherein the dissolution-controlled regime is transitioned to the expansion-controlled regime at a gel point dose.

29. The method of claim 18, wherein the method of simulating the development process of photoresists comprises stochastically simulating the development process of photoresists.

30. The method of claim 18, further comprising correcting the optical proximity of the mask on a full chip.

31. The method of claim 18, further comprising placing and verifying the mask sub-resolution assist feature on a full chip.

32. The method of claim 18, further comprising repairing the mask sub-resolution assist feature.

33. The method of claim 18, further comprising inspecting the mask on a full chip.

34. The method of claim 18, further comprising identifying, diagnosing, and/or repairing a mask hot-spot on a full chip.