MEMS apparatus having impact absorber

• US 10,011,476 B1
• Filed: 12/29/2016
• Issued: 07/03/2018
• Est. Priority Date: 12/29/2016
• Status: Active Grant

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Hsu, Yu-Wen, Kuo, Chin-Fu, Huang, Chao-Ta
• Primary Examiner(s): Potter, Roy
• Assistant Examiner(s): Patton, Paul
• Application Number:
  US15/393,268
• Publication Number:
  US 20180186624A1
• Time in Patent Office: 551 Days
• CPC Class Codes: B81B 3/0051 For defining the movement, i.e. structures that guide or limit the movement of an element mechanical arrangements for preventing or damping vibration or shock H01H3/60
• CPC Class Codes: B81B 3/0072 For controlling internal stress or strain in moving or flexible elements, e.g. stress compensating layers
• CPC Class Codes: B81B 3/0086 Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage

Abstract

A MEMS apparatus includes a substrate, a cover disposed on the substrate, a movable mass disposed on the substrate, and an impact absorber disposed on the cover. The impact absorber includes a restraint, a stationary stopper disposed on a lower surface of the cover, a movable stopper, elastic elements connecting the restraint and the movable stopper, a supporting element connecting the restraint and the stationary stopper, and a space disposed between the stationary stopper and the movable stopper. The impact absorber is adapted to prevent the movable mass from impacting the cover. In addition, the supporting element may be made of an electrical insulation material to reduce electrostatic interaction between the movable mass and the movable stopper.

Claims

1. A MEMS apparatus, comprising:

a substrate;

a cover disposed on the substrate;

a movable mass disposed on the substrate; and

an impact absorber disposed on the cover, the impact absorber comprising;

a restraint;

a stationary stopper disposed on a lower surface of the cover;

a movable stopper;

an elastic element connecting the restraint and the movable stopper;

a supporting element connected between the restraint and the stationary stopper; and

a space disposed between the stationary stopper and the movable stopper.

2. The MEMS apparatus of claim 1, wherein the space is surrounded by the supporting element.

3. The MEMS apparatus of claim 1, wherein the movable stopper is configured to move toward the cover and an upper surface of the movable stopper is adapted to enter the space when the movable mass hits the movable stopper.

4. The MEMS apparatus of claim 1, wherein the movable stopper is adapted to contact the stationary stopper.

5. The MEMS apparatus of claim 1, wherein a movable end of the elastic element connects the movable stopper, a fixed end of the elastic element connects the restraint, and a distance from the movable end to the lower surface of the cover is less than a distance from the fixed end to the lower surface of the cover when the movable stopper moves toward the cover.

6. The MEMS apparatus of claim 1, wherein the movable stopper is electrically insulated from the cover.

7. The MEMS apparatus of claim 6, wherein the supporting element is made of an electrical insulation material.

8. The MEMS apparatus of claim 6, wherein the cover further comprises a first semiconductor layer, a second semiconductor layer, and an electrical insulation layer disposed between the first semiconductor layer and the second semiconductor layer, the movable stopper is electrically insulated from the first semiconductor layer.

9. The MEMS apparatus of claim 8, wherein the movable stopper is electrically connected to the second semiconductor layer, and the movable stopper is adapted to be applied with a voltage through the second semiconductor layer.

10. The MEMS apparatus of claim 6, wherein the cover further comprises a first semiconductor layer, a second semiconductor layer, and an electrical insulation layer disposed between the first semiconductor layer and the second semiconductor layer, and the supporting element is made of the same material as that of the electrical insulation layer, and a thickness of the supporting element is substantially equal to a thickness of the electrical insulation layer.

11. The MEMS apparatus of claim 10, wherein the stationary stopper is made of the same material as that of the first semiconductor layer, the movable stopper is made of the same material as that of the second semiconductor layer, and a distance from an upper surface of the supporting element to an upper surface of the first semiconductor layer is substantially equal to a distance from an upper surface of the electrical insulation layer to an upper surface of the first semiconductor layer.

12. The MEMS apparatus of claim 10, wherein a width of the elastic element is less than a width of the restraint.

13. A MEMS apparatus, comprising:

a substrate;

a cover disposed on the substrate, comprising

a first semiconductor layer;

a second semiconductor layer; and

an electrical insulation layer, wherein the electrical insulation layer is disposed between the first semiconductor layer and the second semiconductor layer;

a movable mass disposed on the substrate;

an impact absorber disposed on the cover, the impact absorber comprising;

a restraint;

a stationary stopper disposed on a lower surface of the cover;

a movable stopper;

an elastic element connecting the restraint and the movable stopper;

a supporting element connecting the restraint and the stationary stopper; and

a space disposed between the stationary stopper and the movable stopper;

wherein the supporting element is made of the same material as that of the electrical insulation layer, and a thickness of the supporting element is substantially equal to a thickness of the electrical insulation layer.

14. The MEMS apparatus of claim 13, wherein the space is surrounded by the supporting element.

15. The MEMS apparatus of claim 13, wherein the movable stopper is configured to move toward the cover and an upper surface of the movable stopper is adapted to enter the space when the movable mass hits the movable stopper.

16. The MEMS apparatus of claim 13, wherein the movable stopper is adapted to contact the stationary stopper.

17. The MEMS apparatus of claim 13, wherein a movable end of the elastic element connects the movable stopper, a fixed end of the elastic element connects the restraint, and a distance from the movable end to the lower surface of the cover is less than a distance from the fixed end to the lower surface of the cover when the movable stopper moves toward the cover.

18. The MEMS apparatus of claim 13, wherein the stationary stopper is made of the same material as that of the first semiconductor layer, the movable stopper is made of the same material as that of the second semiconductor layer, and a distance from an upper surface of the supporting element to an upper surface of the first semiconductor layer is substantially equal to a distance from an upper surface of the electrical insulation layer to an upper surface of the first semiconductor layer.

19. The MEMS apparatus of claim 13, wherein a width of the elastic element is less than a width of the restraint.