Method for reducing porogen accumulation from a UV-cure chamber
First Claim
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1. A method to remove outgassed porogens from a UV chamber, the method comprising:
- providing a purge ring having an inlet portion and an outlet portion;
heating the outlet portion; and
flowing an inert gas from the inlet portion across an underside of a window to the heated outlet portion.
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Abstract
Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
175 Citations
20 Claims
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1. A method to remove outgassed porogens from a UV chamber, the method comprising:
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providing a purge ring having an inlet portion and an outlet portion; heating the outlet portion; and flowing an inert gas from the inlet portion across an underside of a window to the heated outlet portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification