Protrusion bump pads for bond-on-trace processing
First Claim
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1. A method comprising:
- forming an outermost dielectric layer;
forming a conductive trace in the outermost dielectric layer; and
forming a bump pad on the conductive trace, wherein the bump pad extends higher than a top surface of the outermost dielectric layer, wherein a surface of the bump pad opposite the conductive trace is substantially level, wherein the bump pad comprises a first lengthwise axis having a first dimension and a widthwise axis having a second dimension, wherein a ratio of the first dimension to the second dimension is about 0.8 to about 1.2, and wherein an outermost perimeter of the bump pad is disposed fully within an outermost perimeter of the conductive trace in a top-down view.
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Abstract
An embodiment apparatus includes a dielectric layer in a die, a conductive trace in the dielectric layer, and a protrusion bump pad on the conductive trace. The protrusion bump pad at least partially extends over the dielectric layer, and the protrusion bump pad includes a lengthwise axis and a widthwise axis. A ratio of a first dimension of the lengthwise axis to a second dimension of the widthwise axis is about 0.8 to about 1.2.
32 Citations
20 Claims
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1. A method comprising:
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forming an outermost dielectric layer; forming a conductive trace in the outermost dielectric layer; and forming a bump pad on the conductive trace, wherein the bump pad extends higher than a top surface of the outermost dielectric layer, wherein a surface of the bump pad opposite the conductive trace is substantially level, wherein the bump pad comprises a first lengthwise axis having a first dimension and a widthwise axis having a second dimension, wherein a ratio of the first dimension to the second dimension is about 0.8 to about 1.2, and wherein an outermost perimeter of the bump pad is disposed fully within an outermost perimeter of the conductive trace in a top-down view. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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exposing a surface of a conductive trace, wherein the conductive trace is at least partially disposed in a dielectric layer over a substrate; disposing a conductive pad on the surface of the conductive trace, wherein the conductive pad comprises; a lengthwise axis having a first dimension; and a widthwise axis perpendicular to the lengthwise axis and having a second dimension, wherein a ratio of the first dimension to the second dimension is about 0.8 to about 1.2; and recessing a first portion of the surface of the conductive trace not covered by the conductive pad, wherein after recessing the first portion of the surface of the conductive trace, the first portion of the surface of the conductive trace is lower than a second portion of the surface of the conductive trace covered by the conductive pad. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A method comprising:
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forming a dielectric layer over a substrate; disposing a conductive trace at least partially in the dielectric layer; forming a bump pad on the conductive trace, wherein the bump pad extends farther from the substrate than the dielectric layer, and wherein a ratio of a first length of the bump pad to a first width of the bump pad is about 0.8 to about 1.2, wherein the first length is taken along a first axis extending through a center of the bump pad, and wherein the first width is taken along a second axis perpendicular to the first axis and extending through the center of the bump pad; and bonding a die to the conductive trace using a solder region, wherein the solder region is disposed over and along sidewalls of the bump pad, and wherein the solder region extends from a top surface of the bump pad to contact a top surface of the conductive trace. - View Dependent Claims (17, 18, 19, 20)
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Specification