×

Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration

  • US 10,025,885 B2
  • Filed: 01/05/2015
  • Issued: 07/17/2018
  • Est. Priority Date: 11/10/2008
  • Status: Active Grant
First Claim
Patent Images

1. A method comprising:

  • identifying a parameter of a simulation model of a lithographic process;

    designing, by a hardware computer system, a test gauge to calibrate the parameter of the simulation model, the test gauge including two main features having a difference in a metric between them that maximizes sensitivity to changes with respect to the parameter; and

    producing, by the hardware computer system, electronic data to enable production of the test gauge by the lithographic process, where a physical instance of the test gauge is produced by the lithographic process.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×