Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
First Claim
1. A method comprising:
- identifying a parameter of a simulation model of a lithographic process;
designing, by a hardware computer system, a test gauge to calibrate the parameter of the simulation model, the test gauge including two main features having a difference in a metric between them that maximizes sensitivity to changes with respect to the parameter; and
producing, by the hardware computer system, electronic data to enable production of the test gauge by the lithographic process, where a physical instance of the test gauge is produced by the lithographic process.
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Abstract
Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges'"'"' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
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Citations
20 Claims
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1. A method comprising:
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identifying a parameter of a simulation model of a lithographic process; designing, by a hardware computer system, a test gauge to calibrate the parameter of the simulation model, the test gauge including two main features having a difference in a metric between them that maximizes sensitivity to changes with respect to the parameter; and producing, by the hardware computer system, electronic data to enable production of the test gauge by the lithographic process, where a physical instance of the test gauge is produced by the lithographic process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A non-transitory computer program product having recorded thereon instructions which, when executed by a computer system, cause the computer system to at least:
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identify a parameter of a simulation model of a lithographic process; design a test gauge to calibrate the parameter of the simulation model, the test gauge including two main features having a difference in a metric between them that maximizes sensitivity to changes with respect to the parameter; and produce electronic data to enable production of the test gauge by the lithographic process, where a physical instance of the test gauge is produced by the lithographic process. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
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19. A method comprising:
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forming a physical test gauge using a lithographic process, wherein the test gauge includes two main features having a difference in a metric between them that maximizes sensitivity to changes with respect to a parameter of a simulation model of the lithographic process; and measuring the formed test gauge to produce results for calibration of the parameter of the simulation model. - View Dependent Claims (20)
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Specification