Field boosted metal-oxide-semiconductor field effect transistor
First Claim
1. A trench metal-oxide-semiconductor field effect transistor (TMOSFET) comprising:
- a drain region;
a plurality of gate regions disposed above the drain region;
a plurality of drift regions disposed in mesas between the plurality of gate regions and above the drain region;
a plurality of body regions disposed in the mesas, above the plurality of drift regions, and disposed at substantially the same depth as from top to bottom of adjacent plurality of gate regions;
a plurality of source regions disposed in the mesas above the plurality of body regions;
a plurality of gate insulator regions, including;
a thin portion disposed between the plurality of gate regions and the plurality of body regions,a thick portion disposed between the plurality of gate regions and the plurality of drift regions substantially the depth from the top to the bottom of the plurality of drift regions and between the plurality of gate regions and the drain region;
wherein the width of at least one of the mesas is approximately 0.03 to 1.0 microns (μ
m) and is in the order of quantum well dimension at the interface between the plurality of gate insulator regions and the plurality of body regions; and
wherein a thickness of the plurality of gate insulator regions directly between the plurality of gate regions and the drain region is approximately 0.1to 4.0 microns (μ
m) and is selected so that the gate-to-drain electric field in the OFF-state of the device is substantially lateral in the plurality of drift regions and impacts the breakdown voltage.
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Accused Products
Abstract
A trench metal-oxide-semiconductor field effect transistor (TMOSFET) includes a plurality of mesas disposed between a plurality of gate regions. Each mesa includes a drift region and a body region. The width of the mesa is in the order of quantum well dimension at the interface between the gate insulator regions and the body regions The TMOSFET also includes a plurality of gate insulator regions disposed between the gate regions and the body regions, drift regions, and drain region. The thickness of the gate insulator regions between the gate regions and the drain region results in a gate-to-drain electric field in an OFF-state that is substantially lateral aiding to deplete the charge in the drift regions.
35 Citations
20 Claims
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1. A trench metal-oxide-semiconductor field effect transistor (TMOSFET) comprising:
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a drain region; a plurality of gate regions disposed above the drain region; a plurality of drift regions disposed in mesas between the plurality of gate regions and above the drain region; a plurality of body regions disposed in the mesas, above the plurality of drift regions, and disposed at substantially the same depth as from top to bottom of adjacent plurality of gate regions; a plurality of source regions disposed in the mesas above the plurality of body regions; a plurality of gate insulator regions, including; a thin portion disposed between the plurality of gate regions and the plurality of body regions, a thick portion disposed between the plurality of gate regions and the plurality of drift regions substantially the depth from the top to the bottom of the plurality of drift regions and between the plurality of gate regions and the drain region; wherein the width of at least one of the mesas is approximately 0.03 to 1.0 microns (μ
m) and is in the order of quantum well dimension at the interface between the plurality of gate insulator regions and the plurality of body regions; andwherein a thickness of the plurality of gate insulator regions directly between the plurality of gate regions and the drain region is approximately 0.1to 4.0 microns (μ
m) and is selected so that the gate-to-drain electric field in the OFF-state of the device is substantially lateral in the plurality of drift regions and impacts the breakdown voltage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A trench metal-oxide-semiconductor field effect transistor (TMOSFET) comprising:
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a drain region; at least one gate region; at least one mesa, each including a drift region and a body region; and at least one gate insulator region, including; a thin portion disposed between at least one of the gate regions and at least one of the body regions, a thick portion disposed between at least one of the gate regions and at least one of the drift regions substantially the depth from the top to the bottom of at least one of the drift regions and between at least one of the gate regions and at least one of the drain regions, wherein a thickness of at least one of the gate insulator regions directly between at least one of the gate regions and the drain region is approximately 0.1 to 4.0 microns (μ
m) and is selected so that the gate-to-drain electric field in the OFF- state of the device is substantially lateral in at least one of the drift regions and impacts the breakdown voltage;wherein the width of each mesa is approximately 0.03 to 1.0 microns (μ
m) and is in the order of quantum well dimension at the interface between at least one of the gate insulator regions and at least one of the body regions. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification