Cryopump and vacuum pumping method

• US 10,030,640 B2
• Filed: 03/25/2014
• Issued: 07/24/2018
• Est. Priority Date: 03/25/2013
• Status: Active Grant

• Current Assignee: Sumitomo Heavy Industries Limited
• Original Assignee: Sumitomo Heavy Industries Limited
• Inventors: Oikawa, Ken
• Primary Examiner(s): Atkisson, Jianying
• Assistant Examiner(s): Febles, Antonio R
• Application Number:
  US14/224,767
• Publication Number:
  US 20140283532A1
• Time in Patent Office: 1,582 Days
• Field of Search: 62 6, 62 555
• CPC Class Codes: F04B 37/08 by condensing or freezing, e.g. cryogenic pumps
• CPC Class Codes: F04B 37/085 Regeneration of cryo-pumps

Abstract

A cryopump includes a first cryopanel including a radiation shield and a plate member across a shield opening and a second cryopanel enclosed by the first cryopanel and cooled to a lower temperature than that of the first cryopanel. The plate member includes a plate main portion and a plate peripheral portion adapted to attach the plate main portion to the radiation shield. The plate main portion includes a gas passing region having a multitude of pores through which gases pass to be condensed on the second cryopanel and a gas shielding region formed at a different position in the plate main portion from that of the gas passing region.

Claims

1. A cryopump comprising:

a refrigerator orthogonally intersecting a central axis of the cryopump, the refrigerator comprising a first stage and a second stage cooled to a lower temperature than a temperature of the first stage, the first stage and the second stage arranged in a refrigerator longitudinal direction being perpendicular to the central axis of the cryopump;

a first cryopanel comprising a radiation shield having a main opening and a plate member across the main opening, the first cryopanel thermally connected to the first stage;

a second cryopanel enclosed by the first cryopanel and thermally connected to the second stage, the second cryopanel comprising a top cryopanel facing the plate member;

an attaching pedestal forming part of the radiation shield and arranged to attach the first stage of the refrigerator, the attaching pedestal is located lateral to the top cryopanel in the refrigerator longitudinal direction; and

a shield portion forming part of the radiation shield and circumferentially adjoining the attaching pedestal such as to surround the top cryopanel, wherein

between the top cryopanel and the attaching pedestal is formed a lateral gap comprising a narrowed part, and between the top cryopanel and the shield portion is formed a gap part, the lateral gap and the gap part in combination forming an annular gap between the top cryopanel and the radiation shield,

the plate member comprises a plate main portion and a peripheral portion adapted to attach the plate main portion to the radiation shield,

the plate main portion comprises a gas passing region comprising a multitude of pores through which gases pass to be condensed on the second cryopanel and a gas shielding region formed at a different position in the plate main portion from that of the gas passing region,

the gas shielding region is formed axially above the narrowed part of the lateral gap, a circumferential position of the gas shielding region corresponding to the narrowed part of the lateral gap.

2. The cryopump according to claim 1, wherein

the second cryopanel comprises a front face opposed to the plate main portion, the front face comprising a central region and an outside region surrounding the central region, and wherein

the gas passing region is opposed to the outside region while a second gas shielding region is opposed to the central region.

3. The cryopump according to claim 1, wherein

the gas passing region is provided with the pores in a first distribution and the gas shielding region is provided with no pores or pores in a second distribution which differs from the first distribution, the second distribution being determined such that an opening area per unit area in the gas shielding region is smaller than an opening area per unit area in the gas passing region.

4. The cryopump according to claim 1, wherein

the second cryopanel is shaped or located such that the lateral gap is comparable in width to the annular gap.

5. The cryopump according to claim 1, wherein

as viewed along the central axis of the cryopump, an outline of the top cryopanel comprises a chord located adjacent to the attaching pedestal to form the lateral gap between the chord and the attaching pedestal.

6. The cryopump according to claim 1, wherein

the second cryopanel is located to be away from the attaching pedestal such that a center of the second cryopanel is deviated from the central axis of the cryopump passing the main opening.

7. The cryopump according to claim 1, wherein

the radiation shield is provided with an attaching hole for the refrigerator, wherein

the refrigerator comprises a connecting portion connecting the first stage to the second stage, and the connecting portion is inserted into the attaching hole, and wherein

between the connecting portion and the attaching hole, an upper gap is formed on a side closer to the main opening with respect to the refrigerator, and a lower gap is formed on a side further away from the main opening with respect to the refrigerator, and a width of the upper gap is larger than a width of the lower gap.

8. A vacuum pumping method using the cryopump according to claim 1, wherein

the cryopump comprises a plate member across a main opening and a second cryopanel opposed to the plate member,

the method comprising:

cooling the plate member and the second cryopanel to a first temperature and a second temperature, which is lower than the first temperature, respectively;

receiving gases into a space between the plate member and the second cryopanel through a multitude of pores formed at a part of a surface of the plate member; and

condensing the gases on the second cryopanel.

9. The cryopump according to claim 1, wherein the multitude of pores is arranged in a asymmetric manner on the plate main portion such that the gas passing region is provided with the pores in a first distribution and the gas shielding region is provided with no pores or pores in a second distribution which differs from the first distribution, the second distribution being determined such that an opening area per unit area in the gas shielding region is smaller than an opening area per unit area in the gas passing region.