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EUV exposure apparatus with reflective elements having reduced influence of temperature variation

  • US 10,031,423 B2
  • Filed: 07/14/2017
  • Issued: 07/24/2018
  • Est. Priority Date: 07/30/2010
  • Status: Active Grant
First Claim
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1. A mirror comprising:

  • a body MBk having a reflective surface MSk;

    a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T0k;

    said body MBk is at least partly coated with a resistive coating C2, wherein the resistive coating C2 has an electrical resistance suitable to heat the body by electrical resistive heating;

    said mirror being adapted for a projection lens of an EUV-lithographic projection exposure system for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light with a wavelength in a wavelength range of less than 50 nm; and

    ,wherein the coating C2 covers at least part of the mirror body MBk on at least one surface that does not comprise the area of the reflective surface MSk.

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