Fabrication of high efficiency, high quality, large area diffractive waveplates and arrays

• US 10,031,424 B2
• Filed: 07/28/2015
• Issued: 07/24/2018
• Est. Priority Date: 04/21/2010
• Status: Active Grant

• Current Assignee: Beam Engineering For Advanced Measurements Co.
• Original Assignee: Beam Engineering For Advanced Measurements Co., The United States Of America As Represented By The Secretary Of The Army
• Inventors: Tabirian, Nelson V., Nersisyan, Sarik R., Kimball, Brian R., Steeves, Diane M.
• Primary Examiner(s): Angebranndt, Martin J
• Application Number:
  US14/810,569
• Publication Number:
  US 20160026092A1
• Time in Patent Office: 1,092 Days
• Field of Search: None
• CPC Class Codes: G02B 5/3083 Birefringent or phase retarding elements G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03H 2001/0439 for recording Holographic Optical Element [HOE] HOE per se G02B5/32
• CPC Class Codes: G03H 2260/51 Photoanisotropic reactivity wherein polarized light induces material birefringence, e.g. azo-dye doped polymer

Abstract

The objective of the present invention is providing a method for fabricating high quality diffractive waveplates and their arrays that exhibit high diffraction efficiency over large area, the method being capable of inexpensive large volume production. The method uses a polarization converter for converting the polarization of generally non-monochromatic and partially coherent input light beam into a pattern of periodic spatial modulation at the output of said polarization converter. A substrate carrying a photoalignment layer is exposed to said polarization modulation pattern and is coated subsequently with a liquid crystalline material. The high quality diffractive waveplates of the present invention are obtained when the exposure time of said photoalignment layer exceeds by generally an order of magnitude the time period that would be sufficient for producing homogeneous orientation of liquid crystalline materials brought in contact with said photoalignment layer. Compared to holographic techniques, the method is robust with respect to mechanical noises, ambient conditions, and allows inexpensive production via printing while also allowing to double the spatial frequency of optical axis modulation of diffractive waveplates.

Claims

1. A method for producing orientation modulation of an anisotropy axis of a photoresponsive material layer at a predetermined spatial period, the method comprising:

(a) emitting a light beam being at least partially coherent and having a linear polarization from a light source;

(b) using a polarization converter to periodically modulate in space the polarization of said light beam, the polarization converter having an optical axis modulation period that is twice larger than said predetermined spatial period, said polarization converter comprising at least one diffractive waveplate that is achromatic and is part of an array of diffractive waveplates, and provides diffraction efficiency greater than 95% over an area of greater than 1″

in diameter, and scattering losses less than 1%;

(c) providing a photoresponsive material layer having an absorption spectrum that comprises wavelengths of said light beam, and having an anisotropy axis that is formed according to polarization of said light beam; and

(d) exposing at least a portion of said photoresponsive material layer by projecting a polarization modulation pattern produced by said polarization converter at an exposure energy density optimized for producing alignment of the anisotropy axis of the photoresponsive material layer at a predetermined spatial period without causing degradation of the photoresponsive material layer, said exposure energy density exceeding at least 5 times the exposure energy density sufficient for producing waveplates with homogeneous orientation of the optical axis whereby a sole result of exposing the photoresponsive material layer to the polarization modulation pattern is the alignment of the anisotropy axis in said photoresponsive material according to the polarization modulation pattern.

2. The method of claim 1 wherein said projecting generally changes the size, shape and topography of said polarization modulation pattern obtained at the output of said polarization converter.

3. The method of claim 1 wherein said at least one diffractive waveplate comprises at least one cycloidal diffractive waveplate.

4. The method of claim 1 further comprising providing at least one substrate for controlling at least one of the following properties of said photoresponsive material layer:

mechanical shape and stability, thermal conductivity, thickness homogeneity, radiation resistance, and resistance to adverse ambient conditions.

5. The method of claim 1 further comprising at least one anisotropic material layer, wherein said optical axis modulation of at least one of said anisotropic material layers is twisted in a direction perpendicular to the modulation plane of the anisotropy axis of said photoresponsive material layer.

6. An apparatus for producing spatially periodic orientation modulation of an anisotropy axis of a photoresponsive material layer at a predetermined spatial period, the apparatus comprising:

(a) a light source emitting a linearly polarized light beam that is at least partially coherent;

(b) a polarization converter configured to periodically modulate the polarization of said light beam along a single axis to generate a polarization modulation pattern, the polarization converter having an optical axis modulation period that is twice larger than the predetermined spatial period of said spatially periodic orientation modulation of anisotropy axis of the photoresponsive material layer, said polarization converter comprises at least one diffractive waveplate that is achromatic and is part of an array of diffractive waveplates and provides diffraction efficiency greater than 95% over an area greater than 1″

in diameter, and scattering losses less than 1%;

(c) a photoresponsive material having an absorption spectrum that comprises wavelengths of said light beam and an anisotropy axis that is formed or aligned according to polarization of said light beam;

(d) means for holding and positioning a layer of said photoresponsive material;

(e) means for positioning and projecting the polarization modulation pattern onto at least a portion of said photoresponsive material layer;

(f) means for exposing different areas of said photoresponsive material layer to said polarization modulation pattern at an exposure energy density optimized for producing alignment of the anisotropy axis of the photoresponsive material layer at a predetermined spatial period without causing degradation of said photoresponsive material, said exposure energy density exceeding at least 5 times the exposure energy density sufficient for producing waveplates with homogeneous orientation of the optical axis whereby solely the anisotropy axis in said photoresponsive material is aligned according to the polarization modulation pattern of the polarization converter.

7. The apparatus of claim 6 wherein the means for holding and positioning the layer of said photoresponsive material include at least one of the following:

a glass substrate;

a polymer substrate, a drum, a translation stage, and a rotation stage.

8. The apparatus as in claim 6 wherein the means for exposing different areas of said photoresponsive material layer to said polarization modulation pattern includes at least one of the mechanical motions, translation in the direction perpendicular to the polarization modulation axis, and rotation, said motions performed with the aid of at least one of said positioning means:

the positioning means of the holder of said photoresponsive material layer, and the positioning means of said polarization modulation pattern.

9. The apparatus as in claim 6 further comprising at least one anisotropic material layer with an optical axis modulation according to and under the influence of the anisotropy axis of the photoresponsive material layer.

10. The apparatus as claimed in claim 6 wherein said diffractive waveplate comprises at least one cycloidal waveplate.