Light-emitting device

• US 10,032,840 B2
• Filed: 11/08/2016
• Issued: 07/24/2018
• Est. Priority Date: 02/29/2000
• Status: Expired due to Fees

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Yamazaki, Shunpei, Koyama, Jun, Osada, Mai
• Primary Examiner(s): Abdulselam, Abbas I
• Application Number:
  US15/345,677
• Publication Number:
  US 20170154940A1
• Time in Patent Office: 623 Days
• CPC Class Codes: G09G 2300/0417 Special arrangements specific to the use of low carrier mobility technology
• CPC Class Codes: G09G 2300/0426 Layout of electrodes and connections
• CPC Class Codes: G09G 2300/0809 Several active elements per pixel in active matrix panels
• CPC Class Codes: G09G 2300/0814 used for selection purposes, e.g. logical AND for partial update
• CPC Class Codes: G09G 2300/0819 used for counteracting undesired variations, e.g. feedback or autozeroing
• CPC Class Codes: G09G 2300/0842 forming a memory circuit, e.g. a dynamic memory with one capacitor
• CPC Class Codes: G09G 2300/0852 being a dynamic memory with more than one capacitor
• CPC Class Codes: G09G 2300/0861 with additional control of the display period without amending the charge stored in a pixel memory, e.g. by means of additional select electrodes
• CPC Class Codes: G09G 2320/0233 Improving the luminance or brightness uniformity across the screen
• CPC Class Codes: G09G 2320/043 Preventing or counteracting the effects of ageing
• CPC Class Codes: G09G 3/3233 with pixel circuitry controlling the current through the light-emitting element
• CPC Class Codes: G09G 3/3266 Details of drivers for scan electrodes
• CPC Class Codes: G09G 3/3275 Details of drivers for data electrodes
• CPC Class Codes: H01L 27/1214 comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
• CPC Class Codes: H01L 27/1222 with a particular composition, shape or crystalline structure of the active layer
• CPC Class Codes: H01L 27/1251 comprising TFTs having a different architecture, e.g. top- and bottom gate TFTs
• CPC Class Codes: H01L 27/1296 adapted to increase the uniformity of device parameters
• CPC Class Codes: H01L 29/42384 for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
• CPC Class Codes: H01L 29/4908 for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/78621 with LDD structure or an extension or an offset region or characterised by the doping profile
• CPC Class Codes: H01L 29/78627 : with a significant overlap between the lightly doped drain and the gate electrode, e.g. GOLDD
• CPC Class Codes: H01L 29/78654 : Monocrystalline silicon transistors
• CPC Class Codes: H01L 29/7866 : Non-monocrystalline silicon transistors
• CPC Class Codes: H01L 29/78672 : Polycrystalline or microcrystalline silicon transistor
• CPC Class Codes: H01L 29/78696 : characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel H01L29/78612 takes precedence; transistors having a drain offset region or a lightly doped drain [LDD] H01L29/78621
• CPC Class Codes: H10K 50/805 : Electrodes
• CPC Class Codes: H10K 59/00 : Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
• CPC Class Codes: H10K 59/12 : Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/1201 : Manufacture or treatment
• CPC Class Codes: H10K 59/1213 : the pixel elements being TFTs
• CPC Class Codes: H10K 59/1216 : the pixel elements being capacitors
• CPC Class Codes: H10K 59/123 : Connection of the pixel electrodes to the thin film transistors [TFT]
• CPC Class Codes: H10K 59/124 : Insulating layers formed between TFT elements and OLED elements
• CPC Class Codes: H10K 59/35 : comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 59/871 : Self-supporting sealing arrangements
• CPC Class Codes: H10K 59/8722 : Peripheral sealing arrangements, e.g. adhesives, sealants

Abstract

There is provided a semiconductor device including a first pixel and a second pixel each including a transistor and an EL element including a pixel electrode electrically connected to the transistor. A ratio of a channel width (W) to a channel length (L) of the transistor in the first pixel is different from a ratio of a channel width (W) to a channel length (L) of the transistor in the second pixel.

Claims

1. A semiconductor device comprising:

a first pixel comprising;

a first transistor comprising a first semiconductor film including a first channel forming region, the first channel forming region having a first channel width and a first channel length; and

a first EL element connected to the first transistor; and

a second pixel comprising;

a second transistor comprising a second semiconductor film including a second channel forming region, the second channel forming region having a second channel width and a second channel length; and

a second EL element connected to the second transistor,

wherein a ratio of the first channel width to the first channel length is different from a ratio of the second channel width to the second channel length,

wherein the first EL element and the second EL element comprise a first EL material and a second EL material, respectively,

wherein the first EL material is different from the second EL material, and

wherein each of the first channel forming region and the second channel forming region comprises crystalline silicon.

2. The semiconductor device according to claim 1, wherein each of the first transistor and the second transistor is a current controlling transistor.

3. The semiconductor device according to claim 1, wherein each of the first transistor and the second transistor is a top-gate transistor.

4. The semiconductor device according to claim 1, wherein emission color of the first pixel is different from that of the second pixel.

5. The semiconductor device according to claim 1, further comprising:

a first switching transistor having a double gate structure, the first switching transistor being connected to the first transistor; and

a second switching transistor having a double gate structure, the second switching transistor being connected to the second transistor.

6. The semiconductor device according to claim 1, wherein the ratio of the first channel width to the first channel length is equal to or larger than 2.26×

10<sup>−

3</sup> and equal to or smaller than 0.214.

7. The semiconductor device according to claim 1, wherein each of the first transistor and the second transistor is a p-channel transistor.

8. The semiconductor device according to claim 1, wherein each of the first transistor and the second transistor includes an LDD region.

9. An electronic apparatus having the semiconductor device according to claim 1, wherein the electronic apparatus is one selected from the group consisting of a video camera, a digital camera, a goggle type display, a car navigation system, an audio reproduction device, a notebook personal computer, a game equipment, a mobile computer, a mobile telephone, a mobile game equipment, an electronic book, and an image reproduction device provided with a recording medium.

10. A semiconductor device comprising:

a first pixel comprising;

a first transistor comprising a first semiconductor film including a first channel forming region, the first channel forming region having a first channel width and a first channel length; and

a first pixel electrode electrically connected to the first transistor;

a second pixel comprising;

a second transistor comprising a second semiconductor film including a second channel forming region, the second channel forming region having a second channel width and a second channel length; and

a second pixel electrode electrically connected to the second transistor;

a flattening layer interposed between the first channel forming region and the first pixel electrode; and

a layer including an organic material, the layer being over and in contact with the first pixel electrode,

wherein a ratio of the first channel width to the first channel length is different from a ratio of the second channel width to the second channel length, and

wherein each of the first channel forming region and the second channel forming region comprises crystalline silicon.

11. The semiconductor device according to claim 10, wherein each of the first transistor and the second transistor is a current controlling thin film transistor.

12. The semiconductor device according to claim 10, wherein each of the first transistor and the second transistor is a top-gate transistor.

13. The semiconductor device according to claim 10,

wherein the first pixel further comprises a first EL element, and

wherein the second pixel further comprises a second EL element.

14. The semiconductor device according to claim 10,

wherein the first pixel further comprises a first switching transistor, and

wherein the second pixel further comprises a second switching transistor.

15. The semiconductor device according to claim 10, wherein the ratio of the first channel width to the first channel length is equal to or larger than 2.26×

10<sup>−

3</sup> and equal to or smaller than 0.214.

16. The semiconductor device according to claim 10, wherein each of the first transistor and the second transistor is a p-channel transistor.

17. The semiconductor device according to claim 10, wherein each of the first transistor and the second transistor includes an LDD region.

18. An electronic apparatus having the semiconductor device according to claim 10, wherein the electronic apparatus is one selected from the group consisting of a video camera, a digital camera, a goggle type display, a car navigation system, an audio reproduction device, a notebook personal computer, a game equipment, a mobile computer, a mobile telephone, a mobile game equipment, an electronic book, and an image reproduction device provided with a recording medium.

19. A semiconductor device comprising:

a transistor;

a first interlayer insulating film over the transistor;

a pixel electrode over the first interlayer insulating film and electrically connected to the transistor, wherein part of the pixel electrode is provided in a contact hole provided in the first interlayer insulating film,

an insulating film in contact with the first interlayer insulating film and an edge portion of the pixel electrode, wherein part of the insulating film in the contact hole is in contact with the pixel electrode;

an EL layer over the pixel electrode and the insulating film; and

an electrode overlapping with the pixel electrode with the EL layer interposed therebetween,

wherein a ratio of a channel width to a channel length of the transistor is lower than or equal to 0.214.

20. The semiconductor device according to claim 19, wherein the ratio of the channel width to the channel length is larger than or equal to 2.26×

10<sup>−

3</sup> and lower than or equal to 0.214.

21. The semiconductor device according to claim 19, wherein the transistor does not comprise an LDD region.

22. The semiconductor device according to claim 19, wherein the transistor comprises crystalline silicon.

23. The semiconductor device according to claim 19, wherein the insulating film comprises an organic resin.

24. The semiconductor device according to claim 19, wherein a gate insulating layer of the transistor comprises:

a first portion overlapping with a gate electrode of the transistor; and

a second portion not overlapping with the gate electrode of the transistor and having a thickness smaller than the first portion.

25. The semiconductor device according to claim 19, comprising a power supply line electrically connected to the pixel electrode through the transistor.

26. The semiconductor device according to claim 25, comprising a capacitor electrically connected to the power supply line.

27. The semiconductor device according to claim 19, comprising a first substrate and a second substrate between which the transistor, the pixel electrode, and the EL layer are positioned.

28. The semiconductor device according to claim 27, wherein the first substrate and the second substrate are each a glass substrate.

29. The semiconductor device according to claim 27, comprising a first sealant between the first substrate and the second substrate.

30. The semiconductor device according to claim 29, comprising a second sealant outer than the first sealant.

31. The semiconductor device according to claim 27, wherein:

the first interlayer insulating film comprises a first region overlapping with the insulating film and a second region not overlapping with the insulating film;

the EL layer do not overlap with either the first region or the second region; and

the first region and the second region are located at a periphery of the first substrate.

32. The semiconductor device according to claim 19, wherein the transistor is a current controlling transistor.

33. The semiconductor device according to claim 19, wherein the pixel electrode comprises indium.

34. The semiconductor device according to claim 19, wherein the transistor is a top-gate transistor.

35. An electronic apparatus having the semiconductor device according to claim 19, wherein the electronic apparatus is one selected from the group consisting of a video camera, a digital camera, a goggle type display, a car navigation system, an audio reproduction device, a notebook personal computer, a gate equipment, a mobile computer, a mobile telephone, a mobile gate equipment, an electronic book, and an image reproducing device provided with a recording medium.

36. A semiconductor device comprising:

a first pixel and a second pixel each comprising;

a first transistor; and

an EL element comprising;

a pixel electrode electrically connected to the first transistor;

an EL layer over the pixel electrode; and

an electrode overlapping with the pixel electrode with the EL layer interposed therebetween,

wherein a ratio of a channel width to a channel length of the first transistor in the first pixel is different from a ratio of a channel width to a channel length of the first transistor in the second pixel.

37. The semiconductor device according to claim 36, wherein the EL layer in the first pixel comprises a first EL material and the EL layer in the second pixel comprises a second EL material different from the first EL material.

38. The semiconductor device according to claim 36, wherein the channel length is larger than the channel width.

39. The semiconductor device according to claim 36, wherein the ratio of the channel width to the channel length is lower than or equal to 0.214.

40. The semiconductor device according to claim 36, wherein the ratio of the channel width to the channel length is larger than or equal to 2.26×

10<sup>−

3</sup> and lower than or equal to 0.214.

41. The semiconductor device according to claim 36, wherein the first transistor does not comprise an LDD region.

42. The semiconductor device according to claim 36, the wherein the first transistor comprises crystalline silicon.

43. The semiconductor device according to claim 36, wherein a gate insulating layer of the first transistor comprises:

a first portion overlapping with a gate electrode of the first transistor; and

a second portion not overlapping with the gate electrode of the first transistor and having a thickness smaller than the first portion.

44. The semiconductor device according to claim 36, comprising a power supply line electrically connected to the pixel electrode through the first transistor.

45. The semiconductor device according to claim 44, comprising a capacitor electrically connected to the power supply line.

46. The semiconductor device according to claim 36, comprising a first substrate and a second substrate between which the first pixel and the second pixel are positioned.

47. The semiconductor device according to claim 46, wherein the first substrate and the second substrate are each a glass substrate.

48. The semiconductor device according to claim 46, comprising a first sealant between the first substrate and the second substrate.

49. The semiconductor device according to claim 48, comprising a second sealant outer than the first sealant.

50. The semiconductor device according to claim 36, wherein the first transistor is a current controlling transistor.

51. The semiconductor device according to claim 36, wherein the pixel electrode comprises indium.

52. The semiconductor device according to claim 36, wherein the first transistor is a top-gate transistor.

53. An electronic apparatus having the semiconductor device according to claim 36, wherein the electronic apparatus is one selected from the group consisting of a video camera, a digital camera, a goggle type display, a car navigation system, an audio reproduction device, a notebook personal computer, a gate equipment, a mobile computer, a mobile telephone, a mobile gate equipment, an electronic book, and an image reproducing device provided with a recording medium.