Germanium etching systems and methods
First Claim
1. A method of etching a germanium-containing material, the method comprising:
- forming a plasma of a fluorine-containing precursor in a remote plasma region of a semiconductor processing chamber;
flowing plasma effluents of the fluorine-containing precursor through apertures defined in a chamber component, wherein the apertures are coated with a catalytic material;
reducing a concentration of fluorine radicals in the plasma effluents with the catalytic material;
delivering the plasma effluents to a processing region of the semiconductor processing chamber, wherein a substrate comprising a germanium-containing material is housed in the processing region; and
etching the germanium-containing material.
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Abstract
Exemplary methods for etching a germanium-containing material may include forming a plasma of a fluorine-containing precursor in a remote plasma region of a semiconductor processing chamber. The methods may include flowing effluents of the fluorine-containing precursor through apertures defined in a chamber component. The apertures may be coated with a catalytic material. The methods may include reducing a concentration of fluorine radicals in the plasma effluents with the catalytic material. The methods may also include delivering the plasma effluents to a processing region of the semiconductor processing chamber. A substrate having an exposed region of a germanium-containing material may be housed within the processing region. The methods may further include etching the germanium-containing material.
1776 Citations
20 Claims
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1. A method of etching a germanium-containing material, the method comprising:
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forming a plasma of a fluorine-containing precursor in a remote plasma region of a semiconductor processing chamber; flowing plasma effluents of the fluorine-containing precursor through apertures defined in a chamber component, wherein the apertures are coated with a catalytic material; reducing a concentration of fluorine radicals in the plasma effluents with the catalytic material; delivering the plasma effluents to a processing region of the semiconductor processing chamber, wherein a substrate comprising a germanium-containing material is housed in the processing region; and etching the germanium-containing material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of etching a germanium-containing material, the method comprising:
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forming a plasma of a fluorine-containing precursor in a remote plasma region of a semiconductor processing chamber; flowing plasma effluents of the fluorine-containing precursor through a chamber component comprising a catalytic material; catalytically converting at least a portion of fluorine radicals in the plasma effluents by the catalytic material; delivering the plasma effluents to a processing region of the semiconductor processing chamber, wherein a substrate comprising a germanium-containing material is housed in the processing region; and etching the germanium-containing material. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. A method of etching a germanium-containing material, the method comprising:
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forming a plasma of a fluorine-containing precursor in a remote plasma region of a semiconductor processing chamber; flowing plasma effluents of the fluorine-containing precursor through apertures defined in a chamber component, wherein the apertures are coated with a catalytic material, and wherein the chamber component is maintained at a temperature between about 70°
C. and about 150°
C.;reducing a concentration of fluorine radicals in the plasma effluents with the catalytic material; delivering the plasma effluents to a processing region of the semiconductor processing chamber, wherein a substrate comprising a germanium-containing material is housed in the processing region, and wherein the substrate is maintained at a temperature below about 30°
C.; andetching the germanium-containing material. - View Dependent Claims (18, 19, 20)
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Specification