System and method for lithography with leveling sensor
First Claim
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1. A lithography system comprising:
- a reticle stage configured to hold a reticle;
a substrate stage configured to hold a substrate and operable to move relative to the reticle stage;
a leveling signal source configured to direct a leveling signal at the reticle secured on the reticle stage, wherein the leveling signal source is secured to the substrate stage such that the leveling signal source moves with the substrate stage relative to the reticle stage;
a leveling sensor configured to receive the leveling signal from the reticle secured on the reticle stage, wherein the leveling sensor is secured to the substrate stage such that the leveling sensor moves with the substrate stage relative to the reticle stage;
a leveling analysis module operable to receive the leveling signal from the leveling sensor and generate a control parameter based on the received leveling signal;
a control module operable to receive the control parameter from the leveling analysis module and move the reticle stage based on the control parameter; and
wherein the leveling signal source and the leveling sensor are secured to an upper surface of the substrate stage.
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Abstract
Disclosed is a lithography system. The lithography system includes a radiation source for providing radiation energy; a reticle stage configured to hold a reticle; an imaging lens module configured to direct the radiation energy onto a substrate to form an image of the reticle; and a leveling sensor configured to receive a leveling signal from an exposure field of the reticle secured on the reticle stage.
18 Citations
20 Claims
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1. A lithography system comprising:
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a reticle stage configured to hold a reticle; a substrate stage configured to hold a substrate and operable to move relative to the reticle stage; a leveling signal source configured to direct a leveling signal at the reticle secured on the reticle stage, wherein the leveling signal source is secured to the substrate stage such that the leveling signal source moves with the substrate stage relative to the reticle stage; a leveling sensor configured to receive the leveling signal from the reticle secured on the reticle stage, wherein the leveling sensor is secured to the substrate stage such that the leveling sensor moves with the substrate stage relative to the reticle stage; a leveling analysis module operable to receive the leveling signal from the leveling sensor and generate a control parameter based on the received leveling signal; a control module operable to receive the control parameter from the leveling analysis module and move the reticle stage based on the control parameter; and wherein the leveling signal source and the leveling sensor are secured to an upper surface of the substrate stage. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A lithography system comprising:
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a reticle stage configured to hold a reticle; a substrate stage configured to hold a substrate; a leveling signal source configured to direct a leveling signal at the reticle; a leveling sensor configured to receive the leveling signal from the reticle, wherein the leveling signal source and the leveling sensor are secured to an upper surface of the substrate stage; a leveling analysis module operable to analyze the leveling signal; and a control module coupled to the leveling analysis module and configured to control the reticle stage according to feedback from the leveling analysis module. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method comprising:
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scanning a reticle using a leveling signal, wherein scanning the reticle using the leveling signal includes moving a leveling signal source producing the leveling signal while scanning the reticle, wherein the leveling signal source is operable to move in a first direction and a second direction, the second direction being perpendicular to the first direction; after scanning the reticle, generating a control parameter based on the leveling signal; moving the reticle based on the control parameter; and after moving the reticle based on the control parameter, applying radiation energy to the reticle. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification