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Atomic layer deposition of antimony oxide films

  • US 10,056,249 B2
  • Filed: 11/22/2016
  • Issued: 08/21/2018
  • Est. Priority Date: 10/12/2011
  • Status: Active Grant
First Claim
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1. A vapor deposition process for depositing an antimony oxide thin film, comprising alternately and sequentially contacting a substrate in a reaction chamber with a vapor phase antimony source and a vapor phase oxygen source, wherein the antimony source has an oxidation state of +III or +V.

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