Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
First Claim
1. A method of producing coated glass, the method comprising providing a glass pane having opposed first and second surfaces, the method further comprising sputtering a metallic indium tin target in an oxidizing atmosphere so as to deposit a substoichiometric indium tin oxide film on the first surface of the glass pane, thereby producing a coated glass pane, the substoichiometric indium tin oxide film having a thickness of less than 1,800 Å
- , a surface roughness of less than 3 nm, an optical bandgap of 400 nm or longer, and a carrier concentration of 5×
1020/cm3 or less, the method further comprising flash treating the substoichiometric indium tin oxide film so as to produce a flash-treated indium tin oxide film, said flash treating involves using one or more flash lamps to achieve ultra-high-power flash treatment at a peak pulse power of 20-45 kW/cm2, the flash-treated indium tin oxide film having a thickness of less than 1,800 Å
, a surface roughness of less than 3 nm, an optical bandgap of 370 nm or shorter, a carrier concentration of 9×
1020/cm3 or more, and a sheet resistance of less than 15 Ω
/square in combination with providing said coated glass pane with a monolithic visible transmittance of greater than 0.82.
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Accused Products
Abstract
The invention provides flash-treated transparent conductive coatings based on indium tin oxide. Some embodiments provide a method that involves depositing a substoichiometric indium tin oxide film on a glass pane, and thereafter flash treating the substoichiometric indium tin oxide film to produce a flash-treated indium tin oxide film. Other embodiments provide a multiple-pane insulating glass unit having a flash-treated indium tin oxide film on an internal surface.
287 Citations
28 Claims
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1. A method of producing coated glass, the method comprising providing a glass pane having opposed first and second surfaces, the method further comprising sputtering a metallic indium tin target in an oxidizing atmosphere so as to deposit a substoichiometric indium tin oxide film on the first surface of the glass pane, thereby producing a coated glass pane, the substoichiometric indium tin oxide film having a thickness of less than 1,800 Å
- , a surface roughness of less than 3 nm, an optical bandgap of 400 nm or longer, and a carrier concentration of 5×
1020/cm3 or less, the method further comprising flash treating the substoichiometric indium tin oxide film so as to produce a flash-treated indium tin oxide film, said flash treating involves using one or more flash lamps to achieve ultra-high-power flash treatment at a peak pulse power of 20-45 kW/cm2, the flash-treated indium tin oxide film having a thickness of less than 1,800 Å
, a surface roughness of less than 3 nm, an optical bandgap of 370 nm or shorter, a carrier concentration of 9×
1020/cm3 or more, and a sheet resistance of less than 15 Ω
/square in combination with providing said coated glass pane with a monolithic visible transmittance of greater than 0.82. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 20, 21, 22, 23)
- , a surface roughness of less than 3 nm, an optical bandgap of 400 nm or longer, and a carrier concentration of 5×
-
13. A method of producing coated glass, the method comprising providing a glass pane having opposed first and second surfaces, the method further comprising sputtering a metallic indium tin target in an oxidizing atmosphere so as to deposit a substoichiometric indium tin oxide film on the first surface of the glass pane, thereby producing a coated glass pane, the substoichiometric indium tin oxide film having a thickness of greater than 100 Å
- but less than 1,500 Å
, a surface roughness of greater than 1.5 nm but less than 3 nm, an optical bandgap of 400 nm or longer, and a carrier concentration of 5×
1020/cm3 or less, the method further comprising flash treating the substoichiometric indium tin oxide film so as to produce a flash-treated indium tin oxide film, said flash treating involves using one or more flash lamps to achieve ultra-high-power flash treatment at a peak pulse power of 20-45 kW/cm2, the flash-treated indium tin oxide film having a thickness of greater than 100 Å
but less than 1,500 Å
, a surface roughness of greater than 1.5 nm but less than 3 nm, an optical bandgap of 370 nm or shorter, a carrier concentration of 9×
1020/cm3 or more, and a sheet resistance of less than 30 Ω
/square in combination with providing said coated glass pane with a monolithic visible transmittance of greater than 0.85. - View Dependent Claims (14, 15, 16, 17, 18, 19, 24, 25, 26, 27, 28)
- but less than 1,500 Å
Specification