Nitride semiconductor element and nitride semiconductor package
First Claim
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1. A nitride semiconductor element, comprising:
- a Si substrate including a primary surface;
a buffer layer comprised of an AlGaN laminated structure formed by laminating multiple AlGaN layers, the buffer layer having a primary surface which has a c-plane orientation;
a Group III-nitride electron transfer layer formed on the AlGaN laminated structure; and
a Group III-nitride electron supply layer formed on the Group III-nitride electron transfer layer,wherein the AlGaN laminated structure includes a reference AlGaN layer, and an AlGaN layer that is closer to the Si substrate, andwherein the reference AlGaN layer has an a-axis average lattice constant, the AlGaN layer arranged in contact with a surface of the reference AlGaN layer has an a-axis in-plane lattice constant, wherein the surface of the reference AlGaN layer faces the Si substrate, and wherein the a-axis average lattice constant of the reference AlGaN layer is greater than the a-axis in-plane lattice constant of the AlGaN layer arranged in contact with the surface of the reference AlGaN layer, and lower than an original a-axis average lattice constant of the reference AlGaN layer.
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Abstract
A nitride semiconductor element capable of accommodating GaN electron transfer layers of a wide range of thickness, so as to allow greater freedom of device design, and a nitride semiconductor element package with excellent voltage tolerance performance and reliability. On a substrate, a buffer layer including an AlN layer, a first AlGaN layer and a second AlGaN layer is formed. On the buffer layer, an element action layer including a GaN electron transfer layer and an AlGaN electron supply layer is formed. Thus, an HEMT element is constituted.
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21 Claims
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1. A nitride semiconductor element, comprising:
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a Si substrate including a primary surface; a buffer layer comprised of an AlGaN laminated structure formed by laminating multiple AlGaN layers, the buffer layer having a primary surface which has a c-plane orientation; a Group III-nitride electron transfer layer formed on the AlGaN laminated structure; and a Group III-nitride electron supply layer formed on the Group III-nitride electron transfer layer, wherein the AlGaN laminated structure includes a reference AlGaN layer, and an AlGaN layer that is closer to the Si substrate, and wherein the reference AlGaN layer has an a-axis average lattice constant, the AlGaN layer arranged in contact with a surface of the reference AlGaN layer has an a-axis in-plane lattice constant, wherein the surface of the reference AlGaN layer faces the Si substrate, and wherein the a-axis average lattice constant of the reference AlGaN layer is greater than the a-axis in-plane lattice constant of the AlGaN layer arranged in contact with the surface of the reference AlGaN layer, and lower than an original a-axis average lattice constant of the reference AlGaN layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification