GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device
First Claim
1. A GaN substrate, comprising:
- a first main surface; and
a second main surface provided on an opposite side from the first main surface, whereinthe GaN substrate has a disk-shape with a diameter of 45 mm or more,an angle between a normal line of the first main surface and an m-axis is 0°
to 20°
,the GaN substrate is made up of n (n being 2, 3 or
4) crystal regions each exposed at both the first main surface and second main surface,the n crystal regions are arrayed in one row in a direction of an orthogonal projection of a c-axis on the first main surface, andwhen the first main surface is divided into an outer peripheral portion measuring 3 mm or less from an edge and a central portion surrounded by the outer peripheral portion, and the central portion is divided into a plurality of square partitions each having a 5 mm side, at least one square region, which has a 100 μ
m side and in which no dark spots are detected in a CL measurement, is observed within each of the partitions.
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Abstract
A disc-like GaN substrate is a substrate produced by a tiling method and having an angel between the normal line and m-axis on the main surface of the substrate of 0 to 20° inclusive and a diameter of 45 to 55 mm, to 4 or less. In a preferred embodiment, a disc-like GaN substrate has a first main surface and a second main surface that is opposite to the first main surface, and which has an angle between the normal line and m-axis on the first main surface of 0 to 20° inclusive and a diameter of 45 mm or more. The disc-like GaN substrate comprises at least four crystalline regions each being exposed to both of the first main surface and the second main surface, wherein the four crystalline regions are arranged in line along the direction of the orthogonal projection of c-axis on the first main surface.
35 Citations
13 Claims
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1. A GaN substrate, comprising:
-
a first main surface; and a second main surface provided on an opposite side from the first main surface, wherein the GaN substrate has a disk-shape with a diameter of 45 mm or more, an angle between a normal line of the first main surface and an m-axis is 0°
to 20°
,the GaN substrate is made up of n (n being 2, 3 or
4) crystal regions each exposed at both the first main surface and second main surface,the n crystal regions are arrayed in one row in a direction of an orthogonal projection of a c-axis on the first main surface, and when the first main surface is divided into an outer peripheral portion measuring 3 mm or less from an edge and a central portion surrounded by the outer peripheral portion, and the central portion is divided into a plurality of square partitions each having a 5 mm side, at least one square region, which has a 100 μ
m side and in which no dark spots are detected in a CL measurement, is observed within each of the partitions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification