Multi-layer wiring structure, magnetic element and manufacturing method thereof
First Claim
1. A manufacturing method of a multi-layer wiring structure, comprising steps of:
- providing a first conductive structure and a second conductive structure, each of the first conductive structure and the second conductive structure comprising a plurality of wiring patterns and being a single conductive layer made of a metal material or an alloy material, the first conductive structure or the second conductive structure comprising a confining structure at an edge of the first conductive structure or the second conductive structure or a space between two of the wiring patterns, the first conductive structure comprising a first connection strip and the second conductive structure comprising a second connection strip, the wiring patterns of the first conductive structure having the same shape and being connected to the first connection strip, the wiring patterns of the second conductive structure having the same shape and being connected to the second connection strip;
disposing an insulating layer between the first conductive structure and the second conductive structure;
inserting a first positioning pin in a first positioning hole formed on the confining structure along a laminating direction; and
laminating the first conductive structure, the insulating layer and the second conductive structure to form the multi-layer wiring structure, wherein an entire insulating thickness between the first conductive structure and the second conductive structure is thinner than the single conductive layer of the first conductive structure or the second conductive structure after the laminating step.
1 Assignment
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Accused Products
Abstract
A multi-layer wiring structure includes a first conductive structure, a second conductive structure and an insulating layer. To manufacturing the multi-layer wiring structure, a first conductive structure and a second conductive structure are provided. The first conductive structure and the second conductive structure include a plurality of wiring patterns. Then, the insulating layer is disposed between the first conductive structure and the second conductive structure. The insulting layer is thinner than the first conductive structure or the second conductive structure. The first conductive structure, the insulating layer and the second conductive structure are laminated to form the multi-layer wiring structure. A planar magnetic element having a compact coil manufactured by the method is also provided.
23 Citations
17 Claims
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1. A manufacturing method of a multi-layer wiring structure, comprising steps of:
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providing a first conductive structure and a second conductive structure, each of the first conductive structure and the second conductive structure comprising a plurality of wiring patterns and being a single conductive layer made of a metal material or an alloy material, the first conductive structure or the second conductive structure comprising a confining structure at an edge of the first conductive structure or the second conductive structure or a space between two of the wiring patterns, the first conductive structure comprising a first connection strip and the second conductive structure comprising a second connection strip, the wiring patterns of the first conductive structure having the same shape and being connected to the first connection strip, the wiring patterns of the second conductive structure having the same shape and being connected to the second connection strip; disposing an insulating layer between the first conductive structure and the second conductive structure; inserting a first positioning pin in a first positioning hole formed on the confining structure along a laminating direction; and laminating the first conductive structure, the insulating layer and the second conductive structure to form the multi-layer wiring structure, wherein an entire insulating thickness between the first conductive structure and the second conductive structure is thinner than the single conductive layer of the first conductive structure or the second conductive structure after the laminating step. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A manufacturing method of a multi-layer wiring structure, comprising steps of:
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providing a first conductive structure and a second conductive structure, the first conductive structure comprising a first connection strip and a plurality of first wiring patterns connected to the first connection strip, the second conductive structure comprising a second connection strip and a plurality of second wiring patterns connected to the second connection strip, a first positioning hole being formed on the first connection strip and a second positioning hole being formed on the second connection strip; disposing an insulating layer between the first conductive structure and the second conductive structure; inserting a first positioning pin in the first positioning hole and the second positioning hole along a laminating direction, the first positioning pin further penetrating through the insulating layer; and laminating the first conductive structure, the insulating layer and the second conductive structure along the laminating direction to form the multi-layer wiring structure. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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Specification