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Interbody implants and graft delivery systems

  • US 10,070,970 B2
  • Filed: 03/12/2014
  • Issued: 09/11/2018
  • Est. Priority Date: 03/14/2013
  • Status: Active Grant
First Claim
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1. A spinal implant configured for placement within an intervertebral space of a subject, comprising:

  • a distal end and a proximal end, wherein the implant comprises a longitudinal axis that extends from the distal end or the proximal end;

    a first sidewall and a second sidewall extending at least partially from the proximal end to the distal end of the implant, wherein each of the first and second sidewalls are parallel with the longitudinal axis of the implant, wherein the first sidewall and the second sidewall at least partially define at least interior chamber of the implant;

    an inlet opening configured to permit graft material to be selectively delivered into the at least one interior chamber of the implant after implantation of the implant into a subject;

    at least one first sidewall opening located along the first sidewall, wherein the at least one first sidewall opening is configured to extend through the first sidewall; and

    at least one second sidewall opening located along the second sidewall, wherein the at least one second sidewall opening is configured to extend through the second sidewall;

    wherein the at least one interior chamber is in fluid communication with the inlet, the at least one first sidewall opening and the at least one second sidewall opening;

    wherein the at least one first sidewall opening and the at least one second sidewall opening are configured to allow a greater volume of a graft material delivered into the at least one interior chamber to exit through the at least one first sidewall opening relative to the at least one second sidewall opening;

    wherein each of the at least one first sidewall opening and the at least one second sidewall opening is angled relative to the longitudinal axis of the implant by an angle θ

    , wherein θ

    is at least one of;

    (a) 0 to 45 degrees, and (b) greater than 45 degrees;

    wherein both the at least one first sidewall opening and the at least one second sidewall opening are maintained within the distal half of the implant such that graft material exits the at least one interior chamber only through openings along the distal half of the implant; and

    wherein an orientation and configuration of the at least one first sidewall opening and the at least one sidewall opening help create a desired flow pattern for graft material exiting the at least one interior chamber of the implant.

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