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Measuring a process parameter for a manufacturing process involving lithography

  • US 10,073,357 B2
  • Filed: 01/28/2015
  • Issued: 09/11/2018
  • Est. Priority Date: 02/21/2014
  • Status: Active Grant
First Claim
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1. A method of measuring a process parameter for a manufacturing process involving lithography, comprising:

  • performing first and second measurements of overlay error in a region on a substrate using respective first and second target structures; and

    obtaining a measure of the process parameter based on the first and second measurements of overlay error,wherein the first and second target structures are configured such that the first measurement of overlay error is more sensitive to a perturbation in the process parameter than the second measurement of overlay error by a known amount.

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