Electrochromic devices
First Claim
1. A method of fabricating an electrochromic device, the method comprising:
- (a) depositing a tungsten oxide based electrochromic material layer onto a substrate;
the tungsten oxide based electrochromic material layer comprising a portion that is oxygenated to a superstoichiometric level;
(b) depositing a nickel oxide based counter electrode material layer directly onto the tungsten oxide based electrochromic layer;
(c) depositing lithium on the nickel oxide based counter electrode material layer; and
then(d) heating the substrate to form an electronically insulating and ionically conductive material at the interface between the tungsten oxide based electrochromic material layer and the nickel oxide based counter electrode material layer.
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Accused Products
Abstract
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.
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Citations
31 Claims
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1. A method of fabricating an electrochromic device, the method comprising:
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(a) depositing a tungsten oxide based electrochromic material layer onto a substrate;
the tungsten oxide based electrochromic material layer comprising a portion that is oxygenated to a superstoichiometric level;(b) depositing a nickel oxide based counter electrode material layer directly onto the tungsten oxide based electrochromic layer; (c) depositing lithium on the nickel oxide based counter electrode material layer; and
then(d) heating the substrate to form an electronically insulating and ionically conductive material at the interface between the tungsten oxide based electrochromic material layer and the nickel oxide based counter electrode material layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of fabricating an electrochromic device, the method comprising:
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(i) depositing a first electrochromic material layer of formula MOx onto a substrate, wherein M is a metal and the value of x is a number equal to a stoichiometric amount of oxygen for the metal; (ii) depositing a second electrochromic material layer of formula NOy directly onto the first electrochromic material layer, where N is the metal or a different metal and the value of y is a number equal to a superstoichiometric amount of oxygen for the metal or the different metal; (iii) depositing a nickel oxide based counter electrode material layer directly onto the second electrochromic material layer; (iv) depositing lithium on the nickel oxide based counter electrode material; and
then(v) heating the substrate to form an electronically insulating and ionically conductive material at the interface between the second electrochromic material layer and the nickel oxide based counter electrode material layer. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification