Methods for removing halogenated ethylene impurities in 2, 3, 3, 3-tetrafluoropropene product

• US 10,099,977 B2
• Filed: 09/16/2016
• Issued: 10/16/2018
• Est. Priority Date: 03/15/2013
• Status: Active Grant

• Current Assignee: Honeywell International Inc.
• Original Assignee: Honeywell International Inc.
• Inventors: Wang, Haiyou, Tung, Hsueh Sung
• Primary Examiner(s): Parsa, Jafar F
• Application Number:
  US15/267,599
• Publication Number:
  US 20170001931A1
• Time in Patent Office: 760 Days
• CPC Class Codes: C07B 2200/09 Geometrical isomers
• CPC Class Codes: C07C 17/087 to unsaturated halogenated hydrocarbons
• CPC Class Codes: C07C 17/25 by splitting-off hydrogen halides from halogenated hydrocarbons
• CPC Class Codes: C07C 17/389 by adsorption on solids
• CPC Class Codes: C07C 19/10 and chlorine
• CPC Class Codes: C07C 21/18 containing fluorine
• CPC Class Codes: Y02P 20/582 Recycling of unreacted starting or intermediate materials

Abstract

Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH₂═CHF), HCFO-1140 (CH₂═CHCl), and HCFO-1131 (CH₂═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less.

Claims

1. A composition comprised of 2,3,3,3-tetrafluoropropene and first halogenated impurity comprised of HCFO-1140 (CH₂═

CHCl) said halogenated impurity being present in said composition in an amount greater than 0 ppm but less than or equal to 50 ppm, said 2,3,3,3-tetrafluoropropene being present in at least 90% by weight of said composition.

2. The composition according to claim 1 wherein said first halogenated impurity is present in said composition in an amount greater than 0 ppm but less than or equal to 20 ppm.

3. The composition according to claim 1 wherein said first halogenated impurity is present in said composition in an amount greater than 0 but less than or equal to 10 ppm.

4. The composition according to claim 1 wherein a second impurity selected from CF₃C≡

CH, HFO-1243zf (CF₃CH═

CH₂), HFO-1234ze (E/Z-CF₃CH═

CHF), HCFO-1233zd (E/Z-CF₃CH═

CHCl), HCFO-1233xf (CF₃CCl═

CH₂) and combination thereof is additionally present.

5. The composition according to claim 2 wherein a second impurity selected from CF₃C≡

CH, HFO-1243zf (CF₃CH═

CH₂), HFO-1234ze (E/Z-CF₃CH═

CHF), HCFO-1233zd (E/Z-CF₃CH═

CHCl), HCFO-1233xf (CF₃CCl═

CH₂) and combination thereof is additionally present.

6. The composition according to claim 3 wherein a second impurity selected from CF₃C≡

CH, HFO-1243zf (CF₃CH═

CH₂), HFO-1234ze (E/Z-CF₃CH═

CHF), HCFO-1233zd (E/Z-CF₃CH═

CHCl), HCFO-1233xf (CF₃CCl═

CH₂) and combination thereof is additionally present.

7. The composition according to claim 6 wherein the second impurity is HFO-1243zf (CF₃CH═

CH₂), HFO-1234ze (E/Z-CF₃CH═

CHF), or HCFO-1233xf (CF₃CCl═

CH₂).

8. The composition according to claim 1 additionally comprising a third halogenated impurity selected from the group consisting of HFO-1141 (CH₂═

CHF), and HCFO-1131 (CH₂═

CFCl and/or trans/cis-CHF═

CHCl) and combination thereof, said third halogenated impurity and CH₂═

CHCl being present in said composition in an amount greater than 0 ppm and less than or greater 50 ppm.

9. The composition according to claim 8 wherein said third halogenated impurity and CH₂═

CHCl is present in said composition in an amount greater than 0 ppm and less than or greater 20 ppm.

10. The composition according to claim 8 wherein said third halogenated impurity and CH₂═

CHCl is present in said composition in an amount greater than 0 ppm and less than or greater 10 ppm.

11. The composition according to claim 1 additionally comprising 1,3,3,3 tetrafluoro-1-propene.

12. The composition according to claim 8, wherein said third halogenated impurity is CH₂═

CFCl.

13. The composition according to claim 11 wherein 1,3,3,3-tetrafluoro-1-propene is present in its Z-form.

14. The composition according to claim 11 wherein 1,3,3,3-tetrafluoro-1-propene is present in its E-form.