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Methods for removing halogenated ethylene impurities in 2, 3, 3, 3-tetrafluoropropene product

  • US 10,099,977 B2
  • Filed: 09/16/2016
  • Issued: 10/16/2018
  • Est. Priority Date: 03/15/2013
  • Status: Active Grant
First Claim
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1. A composition comprised of 2,3,3,3-tetrafluoropropene and first halogenated impurity comprised of HCFO-1140 (CH2

  • CHCl) said halogenated impurity being present in said composition in an amount greater than 0 ppm but less than or equal to 50 ppm, said 2,3,3,3-tetrafluoropropene being present in at least 90% by weight of said composition.

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