Low-capacitance electrostatic damage protection device and method of designing and making same
First Claim
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1. An electrostatic discharge (ESD) device comprising:
- an active region, wherein the active region comprises;
a first active line comprising a first plurality of gate features; and
a second active line comprising a second plurality of gate features;
a first pick-up line comprising a third plurality of gate features, wherein the first active line is between the first pick-up line and the second active line; and
a second pick-up line comprising a fourth plurality of gate features, wherein the second active line is between the second pick-up line and the first active line.
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Abstract
An electrostatic discharge (ESD) device includes an active region. The active region includes a first active line having a first plurality of gate features; and a second active line having a second plurality of gate features. The ESD device further includes a first pick-up line having a third plurality of gate features, wherein the first active line is between the first pick-up line and the second active line. The ESD device further includes a second pick-up line comprising a fourth plurality of gate features, wherein the second active line is between the second pick-up line and the first active line.
33 Citations
20 Claims
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1. An electrostatic discharge (ESD) device comprising:
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an active region, wherein the active region comprises; a first active line comprising a first plurality of gate features; and a second active line comprising a second plurality of gate features; a first pick-up line comprising a third plurality of gate features, wherein the first active line is between the first pick-up line and the second active line; and a second pick-up line comprising a fourth plurality of gate features, wherein the second active line is between the second pick-up line and the first active line. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An electrostatic discharge (ESD) device comprising:
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a well in a substrate, wherein the well has a first dopant type; an active region over the well, wherein the active region comprises; a first active line comprising a first plurality of gate features, wherein the first active line comprises an upper region having a second dopant type opposite the first dopant type; and a second active line comprising a second plurality of gate features; a first pick-up line over the well, wherein the first pick-up line comprises a third plurality of gate features, the first active line is between the first pick-up line and the second active line, and the first pick-up line comprises an upper region having the first dopant type; and a second pick-up line over the well, wherein the second pick-up line comprises a fourth plurality of gate features, and the second active line is between the second pick-up line and the first active line, wherein the ESD device has a dissipation path extending from the upper region of the first active line through the well to the upper region of the first pick-up line. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. An integrated circuit layout generating system, comprising:
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a non-transitory storage medium for storing a set of instructions; and a hardware processor communicatively coupled with the non-transitory storage medium and configured to execute the set of instructions, the set of instructions being configured to cause the processor to; receive a design of an integrated circuit (IC); decouple front-end components of the IC from back-end components of the IC; determine a layout of the back-end components of the IC; place the front-end components of the IC based on the layout of the back-end components; perform a post-layout simulation based on the layout of the back-end components and the placed front-end components; and adjust the layout of the back-end components in response to a determination that the post-layout simulation fails to satisfy design requirements of the IC. - View Dependent Claims (19, 20)
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Specification