Array substrate and manufacturing method thereof, and display device

• US 10,109,820 B2
• Filed: 07/20/2015
• Issued: 10/23/2018
• Est. Priority Date: 03/25/2015
• Status: Active Grant

• Current Assignee: Beijing BOE Optoelectronics Technology Co Ltd. (BOE Technology Group Co., Ltd.), BOE Technology Group Co., Ltd.
• Original Assignee: Beijing BOE Optoelectronics Technology Co Ltd. (BOE Technology Group Co., Ltd.), BOE Technology Group Co., Ltd.
• Inventors: Yang, Jiuxia, Bai, Feng
• Primary Examiner(s): Everhart, Caridad
• Application Number:
  US14/803,157
• Publication Number:
  US 20160285050A1
• Time in Patent Office: 1,191 Days
• CPC Class Codes: H10K 50/858 comprising refractive means, e.g. lenses
• CPC Class Codes: H10K 59/124 Insulating layers formed between TFT elements and OLED elements
• CPC Class Codes: H10K 59/879 comprising refractive means, e.g. lenses

Abstract

The present invention discloses an array substrate and a manufacturing method thereof, and a display device, wherein the array substrate comprises a base substrate and an electroluminescent device disposed above the base substrate, the array substrate further comprises an additive layer between the base substrate and the electroluminescent device, with a plurality of protrusions being formed on a contact surface of the additive layer with the electroluminescent device, refractive index of the additive layer being less than or equal to that of the base substrate. Light generated by the electroluminescent device successively transmits through the additive layer and the base substrate so as to exit from the array substrate. In the technical solutions of the present invention, by arranging the additive layer between the base substrate and the electroluminescent device, the total amount of light “refracted” from the electroluminescent device into the base substrate can be effectively increased.

Claims

1. An array substrate, comprising a base substrate and an electroluminescent device disposed above the base substrate, wherein the electroluminescent device comprises an anode, an electroluminescent layer, and a cathode which are successively stacked from bottom to top, an additive layer is formed between the base substrate and the electroluminescent device, a plurality of protrusions being formed on a contact surface of the additive layer with the anode of the electroluminescent device, refractive index of the additive layer being less than or equal to that of the base substrate, light generated by the electroluminescent device successively transmitting through the additive layer and the base substrate so as to exit from the array substrate,

wherein a surface of the electroluminescent layer distal to the cathode is provided with a plurality of protrusions, and a surface of the electroluminescent layer proximal to the cathode is configured to be flat, and the cathode disposed on the electroluminescent layer is configured to be a flat layer;

the base substrate is a glass base substrate; and

material of the additive layer is at least one of fluorite, natrolite and albite.

2. The array substrate according to claim 1, wherein the protrusions are tapered.

3. The array substrate according to claim 1, further comprising a thin film transistor disposed between the additive layer and the base substrate, wherein a via hole is formed in the additive layer at a region corresponding to a drain of the thin film transistor, and the anode of the electroluminescent device is connected to the drain of the thin film transistor through the via hole.

4. The array substrate according to claim 1, wherein the electroluminescent device further comprises an electron transfer layer and a hole transfer layer;

and

the electron transfer layer is located between the cathode and the electroluminescent layer, and the hole transfer layer is located between the anode and the electroluminescent layer.

5. The array substrate according to claim 4, wherein the electroluminescent device further comprises an electron and exciton barrier layer and a hole and exciton barrier layer;

and

the electron and exciton barrier layer is disposed between the hole transfer layer and the electroluminescent layer, and the hole and exciton barrier layer is disposed between the electron transfer layer and the electroluminescent layer.

6. A display device, comprising the array substrate according to claim 1.

7. The display device according to claim 6, wherein the protrusions are tapered.

8. The display device according to claim 6, wherein the electroluminescent device comprises an anode, an electroluminescent layer and a cathode which are successively stacked from bottom to top.

9. The display device according to claim 8, further comprising a thin film transistor disposed between the additive layer and the base substrate, wherein a via hole is formed in the additive layer at a region corresponding to a drain of the thin film transistor, and the anode of the electroluminescent device is connected to the drain of the thin film transistor through the via hole.

10. The display device according to claim 8, wherein the electroluminescent device further comprises an electron transfer layer and a hole transfer layer;

and

the electron transfer layer is located between the cathode and the electroluminescent layer, and the hole transfer layer is located between the anode and the electroluminescent layer.

11. The display device according to claim 10, wherein the electroluminescent device further comprises an electron and exciton barrier layer and a hole and exciton barrier layer;

and

the electron and exciton barrier layer is disposed between the hole transfer layer and the electroluminescent layer, and the hole and exciton barrier layer is disposed between the electron transfer layer and the electroluminescent layer.

12. A method for manufacturing an array substrate, comprising the following steps:

forming an additive layer above a base substrate, wherein a plurality of protrusions are formed on a surface of the additive layer away from the base substrate, and refractive index of the additive layer is less than or equal to that of the base substrate; and

forming an electroluminescent device that comprises an anode, an electroluminescent layer, and a cathode which are successively stacked from bottom to top above the additive layer, the anode of the electroluminescent device contacting the surface of the additive layer away from the base substrate, and light generated by the electroluminescent device successively transmitting through the additive layer and the base substrate so as to exit from the array substrate,

wherein a plurality of protrusions are formed on a surface of the electroluminescent layer distal to the cathode and a surface of the electroluminescent layer proximal to the cathode is formed to be flat, and the cathode disposed on the electroluminescent layer is formed to be a flat layer;

the base substrate is a glass base substrate; and

material of the additive layer is at least one of fluorite, natrolite and albite.

13. The method for manufacturing an array substrate according to claim 12, wherein:

before the step of forming the additive layer, the method further comprises;

forming a thin film transistor above the base substrate; and

after the step of forming the additive layer, the method further comprises;

forming a via hole in the additive layer at a region corresponding to a drain of the thin film transistor.

14. The method for manufacturing an array substrate according to claim 12, wherein the step of forming the additive layer comprises:

depositing an additive layer thin film above the base substrate; and

performing surface treatment to the additive layer thin film to form the plurality of protrusions.

15. The method for manufacturing an array substrate according to claim 14, wherein:

before the step of forming the additive layer, the method further comprises;

forming a thin film transistor above the base substrate; and

after the step of forming the additive layer, the method further comprises;

forming a via hole in the additive layer at a region corresponding to a drain of the thin film transistor.

16. The method for manufacturing an array substrate according to claim 12, wherein the step of forming the electroluminescent device comprises:

successively stacking an anode, an electroluminescent layer and a cathode on the additive layer.

17. The method for manufacturing an array substrate according to claim 16, wherein the step of forming the electroluminescent device comprises:

forming an anode above the additive layer;

forming an electroluminescent material solution film above the anode by ink jetting;

drying the electroluminescent material solution film to form the electroluminescent layer; and

forming a cathode above the electroluminescent layer.

18. The method for manufacturing an array substrate according to claim 16, wherein:

before the step of forming the additive layer, the method further comprises;

forming a thin film transistor above the base substrate; and

after the step of forming the additive layer, the method further comprises;

forming a via hole in the additive layer at a region corresponding to a drain of the thin film transistor.