Unidirectional near-field focusing using near-field plates
First Claim
1. A method for unidirectional subwavelength focusing and near-field manipulation using near-field plates, the method comprising:
- generating a source field pattern from an excitation source at a focal plane;
generating a subwavelength field pattern from a near-field plate when the near-field plate is excited by the excitation source, the near-field plate being at a distance, d, from the excitation source;
forming a desired field pattern at the focal plane from the subwavelength field pattern and the source field pattern, the focal plane being at a distance, L, from the excitation source; and
configuring the desired field pattern to be a unidirectional subwavelength field pattern in a desired direction by increasing the amplitude of the desired field pattern in the desired direction.
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Accused Products
Abstract
A near-field plate is a non-periodically patterned surface that can overcome the diffraction limit and confine electromagnetic fields to subwavelength dimensions. By controlling the interference of the electromagnetic fields radiated by the near-field plate with that of a source, the near-field plate can form a subwavelength near-field pattern in a forward direction, while suppressing fields in other directions, such as those reflected. The resulting unidirectional near-field plate may find utility in many applications such as high resolution imaging and probing, high density data storage, biomedical targeting devices, and wireless power transfer.
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Citations
26 Claims
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1. A method for unidirectional subwavelength focusing and near-field manipulation using near-field plates, the method comprising:
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generating a source field pattern from an excitation source at a focal plane; generating a subwavelength field pattern from a near-field plate when the near-field plate is excited by the excitation source, the near-field plate being at a distance, d, from the excitation source; forming a desired field pattern at the focal plane from the subwavelength field pattern and the source field pattern, the focal plane being at a distance, L, from the excitation source; and configuring the desired field pattern to be a unidirectional subwavelength field pattern in a desired direction by increasing the amplitude of the desired field pattern in the desired direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An apparatus for unidirectional subwavelength near-field focusing, the apparatus comprising:
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an excitation source generating a source field pattern; and a near-field plate generating a subwavelength field pattern when excited by the excitation source; wherein after traversing a near-field distance, L, the source field pattern and the subwavelength field pattern form a desired field pattern at a focal plane, wherein the desired field pattern is a unidirectional subwavelength field pattern when the amplitude of the subwavelength field pattern is increased. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification