Thin-film devices and fabrication
First Claim
Patent Images
1. An electrochromic device comprising:
- one or more material layers sandwiched between a first conductor layer and a second conductor layer; and
a taper on at least one underlying layer of the electrochromic device;
wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; and
wherein the laser ablation comprises delivering laser radiation from the same side of a transparent substrate as that upon which the electrochromic device is fabricated or delivering laser radiation from the side of a transparent substrate opposite the side upon which the electrochromic device is fabricated.
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Abstract
Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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Citations
33 Claims
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1. An electrochromic device comprising:
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one or more material layers sandwiched between a first conductor layer and a second conductor layer; and a taper on at least one underlying layer of the electrochromic device; wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; and wherein the laser ablation comprises delivering laser radiation from the same side of a transparent substrate as that upon which the electrochromic device is fabricated or delivering laser radiation from the side of a transparent substrate opposite the side upon which the electrochromic device is fabricated. - View Dependent Claims (2, 3, 4, 13)
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5. An electrochromic device comprising:
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one or more material layers sandwiched between a first conductor layer and a second conductor layer; and a taper on at least one underlying layer of the electrochromic device; wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; wherein the first conductor layer is a transparent conducting oxide layer proximate a transparent substrate upon which the electrochromic device is fabricated; and wherein the taper is on at least the first conductor layer. - View Dependent Claims (6, 7, 8, 9, 10, 11)
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12. An electrochromic device comprising:
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one or more material layers sandwiched between a first conductor layer and a second conductor layer; and a taper on at least one underlying layer of the electrochromic device; wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; wherein the at least one underlying layer with the taper includes the first conductor layer which is a transparent conducting oxide layer proximate a transparent substrate upon which the electrochromic device is disposed; and wherein the layers of the electrochromic device, overlying the at least one underlying layer with the taper, have an overlapping portion extending beyond the taper.
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14. An electrochromic device comprising:
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one or more material layers sandwiched between a first conductor layer and a second conductor layer; and a taper on at least one underlying layer of the electrochromic device; wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; wherein the taper is stepped or beveled.
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15. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon; (b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges, wherein the laser ablation includes using a defocused laser to remove material to create a smooth contour on the two or more tapered edges; and (c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b).
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16. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon; (b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; (c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b); and (d) polishing the at least one layer prior to, or after, (b).
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17. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon; (b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and (c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b); wherein the laser ablation comprises delivering laser radiation from the same side of the transparent substrate upon which the electrochromic device is fabricated or delivering laser radiation from the side of the transparent substrate opposite the side upon which the electrochromic device is fabricated.
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18. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon; (b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and (c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b), wherein the laser ablation comprises using a laser with a pulse duration of one of between about 100 femtoseconds and about 100 nanoseconds, between about 1 picosecond and about 50 nanoseconds, and between about 20 picoseconds and about 30 nanoseconds.
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19. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon; (b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and (c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b); wherein the at least one layer tapered in (b) includes the first conductor layer; and wherein the first conductor layer is a transparent conducting oxide layer proximate the transparent substrate upon which the electrochromic device is fabricated. - View Dependent Claims (20, 21, 22, 23, 24)
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25. An electrochromic device comprising:
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one or more material layers sandwiched between a first conductor layer and a second conductor layer; an isolation trench dividing one or more layers of the electrochromic device into separate sections, wherein the one or more layers comprises the first conductor layer which is proximate a transparent substrate upon which the electrochromic device is fabricated; and an edge taper on the isolation trench. - View Dependent Claims (26, 27)
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28. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:
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i) fabricating an isolation trench in at least one underlying layer of the electrochromic device;
the isolation trench separating a first section of the electrochromic device from a second section;
wherein each of the first and second sections comprise a tapered edge along the isolation trench; andii) fabricating the overlying layers of the electrochromic device over the at least one underlying layer. - View Dependent Claims (29, 30, 31, 32, 33)
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Specification