Thin-film devices and fabrication

• US 10,114,265 B2
• Filed: 08/10/2015
• Issued: 10/30/2018
• Est. Priority Date: 12/12/2011
• Status: Active Grant

• Current Assignee: View Incorporated
• Original Assignee: View Incorporated
• Inventors: Strong, Fabian, Bhatnagar, Yashraj, Dixit, Abhishek Anant, Martin, Todd, Rozbicki, Robert T.
• Primary Examiner(s): Jones, James
• Application Number:
  US14/822,732
• Publication Number:
  US 20150362816A1
• Time in Patent Office: 1,177 Days
• Field of Search: 359275
• CPC Class Codes: B32B 17/10119 having a composition deviating from the basic composition of soda-lime glass, e.g. borosilicate
• CPC Class Codes: B32B 17/10513 Electrochromic layer
• CPC Class Codes: B32B 17/1099 After-treatment of the layered product, e.g. cooling
• CPC Class Codes: C23C 14/086 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: G02B 1/18 Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films G02B1/16 takes precedence
• CPC Class Codes: G02F 1/1523 comprising inorganic material
• CPC Class Codes: G02F 1/153 Constructional details
• CPC Class Codes: G02F 1/1533 structural features not otherwise provided for
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 2001/1536 additional, e.g. protective, layer inside the cell
• CPC Class Codes: H01B 13/00 Apparatus or processes specially adapted for manufacturing conductors or cables
• CPC Class Codes: Y10T 29/49126 Assembling bases

Abstract

Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Claims

1. An electrochromic device comprising:

one or more material layers sandwiched between a first conductor layer and a second conductor layer; and

a taper on at least one underlying layer of the electrochromic device;

wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer; and

wherein the laser ablation comprises delivering laser radiation from the same side of a transparent substrate as that upon which the electrochromic device is fabricated or delivering laser radiation from the side of a transparent substrate opposite the side upon which the electrochromic device is fabricated.

2. The electrochromic device of claim 1, wherein the laser ablation comprises using a laser with a pulse duration of between about 100 femtoseconds and about 100 nanoseconds.

3. The electrochromic device of claim 1, wherein the laser ablation comprises using a laser with a pulse duration of between about 1 picosecond and about 50 nanoseconds.

4. The electrochromic device of claim 1, wherein the laser ablation comprises using a laser with a pulse duration of between about 20 picoseconds and about 30 nanoseconds.

13. The electrochromic device of claim 1, further comprising a diffusion barrier between the transparent substrate and the electrochromic device.

5. An electrochromic device comprising:

one or more material layers sandwiched between a first conductor layer and a second conductor layer; and

a taper on at least one underlying layer of the electrochromic device;

wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer;

wherein the first conductor layer is a transparent conducting oxide layer proximate a transparent substrate upon which the electrochromic device is fabricated; and

wherein the taper is on at least the first conductor layer.

6. The electrochromic device of claim 5, wherein the first conductor layer is polished prior to forming the taper or the first conductor layer is polished after forming the taper.

7. The electrochromic device of claim 5, wherein the first conductor layer is between about 0.25 μ

m and about 1 μ

m thick.

8. The electrochromic device of claim 7, wherein the taper of the first conductor layer is between about 0.25 μ

m and about 1000 μ

m wide.

9. The electrochromic device of claim 7, wherein the taper of the first conductor layer is between about 0.5 μ

m and about 100 μ

m wide.

10. The electrochromic device of claim 7, wherein the taper of the transparent conducting oxide layer is between about 1 μ

m and about 10 μ

m wide.

11. The electrochromic device of claim 5, wherein the taper is part of an isolation trench in the first conductor layer, wherein the isolation trench provides electrical isolation of one section of the electrochromic device from another section of the electrochromic device.

12. An electrochromic device comprising:

one or more material layers sandwiched between a first conductor layer and a second conductor layer; and

a taper on at least one underlying layer of the electrochromic device;

wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer;

wherein the at least one underlying layer with the taper includes the first conductor layer which is a transparent conducting oxide layer proximate a transparent substrate upon which the electrochromic device is disposed; and

wherein the layers of the electrochromic device, overlying the at least one underlying layer with the taper, have an overlapping portion extending beyond the taper.

14. An electrochromic device comprising:

one or more material layers sandwiched between a first conductor layer and a second conductor layer; and

a taper on at least one underlying layer of the electrochromic device;

wherein the taper is formed via laser ablation and wherein the taper spans more than one edge of the at least one underlying layer;

wherein the taper is stepped or beveled.

15. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon;

(b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges, wherein the laser ablation includes using a defocused laser to remove material to create a smooth contour on the two or more tapered edges; and

(c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b).

16. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon;

(b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges;

(c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b); and

(d) polishing the at least one layer prior to, or after, (b).

17. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon;

(b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and

(c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b);

wherein the laser ablation comprises delivering laser radiation from the same side of the transparent substrate upon which the electrochromic device is fabricated or delivering laser radiation from the side of the transparent substrate opposite the side upon which the electrochromic device is fabricated.

18. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon;

(b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and

(c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b),

wherein the laser ablation comprises using a laser with a pulse duration of one of between about 100 femtoseconds and about 100 nanoseconds, between about 1 picosecond and about 50 nanoseconds, and between about 20 picoseconds and about 30 nanoseconds.

19. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

(a) receiving a transparent substrate having at least one layer of the electrochromic device fabricated thereon;

(b) laser ablating at least one layer of the electrochromic device to form two or more tapered edges; and

(c) fabricating one or more additional layers of the electrochromic device over the at least one layer and extending beyond the two or more tapered edges formed in (b);

wherein the at least one layer tapered in (b) includes the first conductor layer; and

wherein the first conductor layer is a transparent conducting oxide layer proximate the transparent substrate upon which the electrochromic device is fabricated.

20. The method of claim 19, wherein the first conductor layer is between about 0.25 μ

m and about 1 μ

m thick.

21. The method of claim 19, wherein (b) forms tapered edges between about 0.25 μ

m and about 1000 μ

m wide.

22. The method of claim 19, wherein (b) forms tapered edges between about 0.5 μ

m and about 100 μ

m wide.

23. The method of claim 19, wherein (b) forms tapered edges between about 1 μ

m and about 10 μ

m wide.

24. The method of claim 19, wherein (b) forms an isolation trench in the first conductor layer, wherein the isolation trench provides electrical isolation of one section of the electrochromic device from another section of the electrochromic device.

25. An electrochromic device comprising:

one or more material layers sandwiched between a first conductor layer and a second conductor layer;

an isolation trench dividing one or more layers of the electrochromic device into separate sections, wherein the one or more layers comprises the first conductor layer which is proximate a transparent substrate upon which the electrochromic device is fabricated; and

an edge taper on the isolation trench.

26. The electrochromic device of claim 25, wherein the first conductor layer is a transparent conducting oxide layer.

27. The electrochromic device of claim 26, wherein the edge taper is stepped or beveled.

28. A method of fabricating an electrochromic device comprising one or more material layers sandwiched between a first conductor layer and a second conductor layer, the method comprising:

i) fabricating an isolation trench in at least one underlying layer of the electrochromic device;

the isolation trench separating a first section of the electrochromic device from a second section;

wherein each of the first and second sections comprise a tapered edge along the isolation trench; and

ii) fabricating the overlying layers of the electrochromic device over the at least one underlying layer.

29. The method of claim 28, wherein the at least one underlying layer includes the first conductor layer disposed adjacent the transparent substrate upon which the electrochromic device is fabricated.

30. The method of claim 29, wherein the first conductor layer is a transparent conducting oxide layer proximate the transparent substrate and i) is performed using a laser ablation step.

31. The method of claim 30, wherein the laser ablation step includes using a defocused laser to generate a smooth contour on the tapered edge.

32. The method of claim 31, further comprising polishing the first conductor layer prior to i) or after i).

33. The method of claim 30, wherein the laser ablation step comprises delivering laser radiation from the same side of the transparent substrate as that upon which the electrochromic device is fabricated or delivering laser radiation from the side of the transparent substrate opposite the side upon which the electrochromic device is fabricated.