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Purging of porogen from UV cure chamber

  • US 10,121,682 B2
  • Filed: 06/03/2016
  • Issued: 11/06/2018
  • Est. Priority Date: 04/26/2005
  • Status: Active Grant
First Claim
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1. A method for removing chemical species from a substrate, comprising:

  • arranging a purge ring in a chamber above (i) a pedestal and (ii) a purge space defined above the pedestal, the purge ring includingan inlet ring wall defining a ring hole space above the purge space, wherein the inlet ring wall corresponds to a continuous structure surrounding the ring hole space, andan inlet baffle formed within the inlet ring wall and surrounding at least 180 degrees of an outer perimeter of the ring hole space;

    supplying gas, received via a gas inlet hole, to an inlet plenum, wherein the inlet plenum is arranged in a first end of the inlet ring wall, the inlet plenum arranged to provide the gas to the ring hole space through the inlet baffle surrounding at least 180 degrees of the outer perimeter of the ring hole space;

    conveying the gas from the inlet plenum into the ring hole space using the inlet baffle surrounding at least 180 degrees of the outer perimeter of the ring hole space;

    exhausting the gas and other matter out of the ring hole space using an exhaust channel formed within a second end of the inlet ring wall and an exhaust outlet hole arranged in the second end of the inlet ring wall; and

    inhibiting deposition of material evolved from the substrate during curing using the purge ring.

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