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Spinal implant system and method

  • US 10,123,882 B2
  • Filed: 07/06/2015
  • Issued: 11/13/2018
  • Est. Priority Date: 07/06/2015
  • Status: Active Grant
First Claim
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1. A spinal implant comprising:

  • an implant body including a first endplate and a second endplate the first endplate including a vertebral engaging surface defining a first electrode, the second endplate including a vertebral engaging surface defining a second electrode, the first and second electrodes being configured to conduct an electric current to stimulate tissue growth adjacent the implant body, a distance between the vertebral engaging surfaces defining a maximum height of the implant body,wherein the first electrode comprises a titanium coated anode and the second electrode comprises a titanium coated cathode.

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