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Metrology method, target and substrate

  • US 10,133,188 B2
  • Filed: 12/21/2016
  • Issued: 11/20/2018
  • Est. Priority Date: 12/23/2015
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization;

    illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization;

    combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference;

    detecting the combined radiation using a detector; and

    determining a parameter of interest from a value of an intensity difference or ratio determined using the detected combined radiation.

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