Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
First Claim
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1. A nanoimprint lithography method comprising:
- disposing a pretreatment composition on a substrate to form a pretreatment coating on the substrate, wherein the pretreatment composition comprises a first polymerizable component;
disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the substrate, wherein the imprint resist is a polymerizable composition and comprises at least one of a fluorinated surfactant and a fluorinated polymerizable component;
forming a composite polymerizable coating on the substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist;
contacting the composite polymerizable coating with a surface of a nanoimprint lithography template; and
polymerizing the composite polymerizable coating to yield a composite polymeric layer on the substrate,wherein the interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°
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Abstract
Facilitating throughput in nanoimprint lithography processes by using an imprint resist including fluorinated components and a substrate treated with a pretreatment composition to promote spreading of an imprint resist on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°.
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Citations
34 Claims
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1. A nanoimprint lithography method comprising:
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disposing a pretreatment composition on a substrate to form a pretreatment coating on the substrate, wherein the pretreatment composition comprises a first polymerizable component; disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the substrate, wherein the imprint resist is a polymerizable composition and comprises at least one of a fluorinated surfactant and a fluorinated polymerizable component; forming a composite polymerizable coating on the substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist; contacting the composite polymerizable coating with a surface of a nanoimprint lithography template; and polymerizing the composite polymerizable coating to yield a composite polymeric layer on the substrate, wherein the interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°
. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A nanoimprint lithography method comprising:
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disposing a pretreatment composition on a substrate to form a pretreatment coating on the substrate, wherein the pretreatment composition comprises a first polymerizable component; disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the substrate, wherein the imprint resist is a polymerizable composition and comprises at least one of a fluorinated surfactant and a fluorinated polymerizable component; forming a composite polymerizable coating on the substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist; contacting the composite polymerizable coating with a surface of a nanoimprint lithography template; and polymerizing the composite polymerizable coating to yield a composite polymeric layer on the substrate, wherein the interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between at least a component of the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°
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Specification