Array substrate, method of manufacturing the same, and display device
First Claim
1. A method of manufacturing an array substrate, comprising:
- forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process by using a single mask;
forming a pattern of an insulating layer; and
forming a pattern comprising a gate and a gate line through a single patterning process,wherein forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process comprises;
forming a semiconductor film on the base substrate;
coating a photoresist on the semiconductor film, exposing the photoresist with a dual tone mask and developing to completely remain the photoresist corresponding to an active layer region, to partially remain the photoresist corresponding to regions of the source, the drain, the data line and the pixel electrode, and to completely remove the photoresist in remaining regions so as to expose the semiconductor film;
etching the exposed semiconductor film;
ashing the photoresist to thin the photoresist corresponding to the active layer region and to expose the semiconductor film in regions other than the active layer region;
transforming the exposed semiconductor film into a conductor by plasma processing to form the pattern comprising the active layer, the source, the drain, the data line and the pixel electrode; and
removing residual photoresist.
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Abstract
Disclosed is an array substrate, a method of manufacturing the same, and a display device. The method of manufacturing an array substrate includes: forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process; forming a pattern of an insulating layer; forming a pattern comprising a gate and a gate line through a single patterning process. In the array substrate, the method of manufacturing the same, and the display device of the present invention, only two patterning processes are required to achieve the fabrication of the array substrate, which has less and simple process steps, thereby reduces the manufacturing complexity and manufacturing cost, and increasing the production efficiency and the economic benefit.
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Citations
5 Claims
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1. A method of manufacturing an array substrate, comprising:
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forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process by using a single mask; forming a pattern of an insulating layer; and forming a pattern comprising a gate and a gate line through a single patterning process, wherein forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process comprises; forming a semiconductor film on the base substrate; coating a photoresist on the semiconductor film, exposing the photoresist with a dual tone mask and developing to completely remain the photoresist corresponding to an active layer region, to partially remain the photoresist corresponding to regions of the source, the drain, the data line and the pixel electrode, and to completely remove the photoresist in remaining regions so as to expose the semiconductor film; etching the exposed semiconductor film; ashing the photoresist to thin the photoresist corresponding to the active layer region and to expose the semiconductor film in regions other than the active layer region; transforming the exposed semiconductor film into a conductor by plasma processing to form the pattern comprising the active layer, the source, the drain, the data line and the pixel electrode; and removing residual photoresist. - View Dependent Claims (2, 3, 4, 5)
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Specification