Dual gate FD-SOI transistor
First Claim
1. A device, comprising:
- a silicon substrate;
a first doped well having a first conductivity type;
a second doped well having the first conductivity type, the second doped well being physically separated from the first doped well;
a first pass gate formed on the silicon substrate, the first pass gate including a fully-depleted silicon-on-insulator (FD-SOI) dual gate NMOS transistor having;
a source terminal,a drain terminal,a primary gate,a secondary gate in the first doped well, the primary gate having a first surface that is spaced apart from the secondary gate by a first distance, anda secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate through the secondary gate contact, the secondary gate contact oriented in a direction transverse to the primary gate and extending from the secondary gate to a second surface, the second surface being spaced apart from the secondary gate by a second distance that is less than the first distance, each of the first voltage, the second voltage, and the third voltage being different from one another; and
a second pass gate formed on the silicon substrate, the second pass gate including a FD-SOI dual gate PMOS transistor having;
a source terminal,a drain terminal,a primary gate,a secondary gate in the second doped well, anda secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate through the secondary gate contact, the secondary gate contact oriented in a direction transverse to the primary gate.
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Accused Products
Abstract
Circuit module designs that incorporate dual gate field effect transistors are implemented with fully depleted silicon-on-insulator (FD-SOI) technology. Lowering the threshold voltages of the transistors can be accomplished through dynamic secondary gate control in which a back-biasing technique is used to operate the dual gate FD-SOI transistors with enhanced switching performance. Consequently, such transistors can operate at very low core voltage supply levels, down to as low as about 0.4 V, which allows the transistors to respond quickly and to switch at higher speeds. Performance improvements are shown in circuit simulations of an inverter, an amplifier, a level shifter, and a voltage detection circuit module.
48 Citations
20 Claims
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1. A device, comprising:
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a silicon substrate; a first doped well having a first conductivity type; a second doped well having the first conductivity type, the second doped well being physically separated from the first doped well; a first pass gate formed on the silicon substrate, the first pass gate including a fully-depleted silicon-on-insulator (FD-SOI) dual gate NMOS transistor having; a source terminal, a drain terminal, a primary gate, a secondary gate in the first doped well, the primary gate having a first surface that is spaced apart from the secondary gate by a first distance, and a secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate through the secondary gate contact, the secondary gate contact oriented in a direction transverse to the primary gate and extending from the secondary gate to a second surface, the second surface being spaced apart from the secondary gate by a second distance that is less than the first distance, each of the first voltage, the second voltage, and the third voltage being different from one another; and a second pass gate formed on the silicon substrate, the second pass gate including a FD-SOI dual gate PMOS transistor having; a source terminal, a drain terminal, a primary gate, a secondary gate in the second doped well, and a secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate through the secondary gate contact, the secondary gate contact oriented in a direction transverse to the primary gate. - View Dependent Claims (2, 3, 4, 5)
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6. A device, comprising:
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a silicon substrate; a first n-well in the substrate; a second n-well in the substrate, the second n-well physically separate from the first n-well; a buried oxide layer on the first and second n-wells; a NMOS dual gate transistor having; a source terminal configured to be electrically coupled to a first voltage, a drain terminal, a primary gate configured to be electrically coupled to a second voltage, a secondary gate in the first n-well, and a secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate and to the second voltage through the secondary gate contact, the primary and secondary gates being accessible from a front side of the silicon substrate, the first voltage and the second voltage being different from one another; and a PMOS dual gate transistor having; a source terminal configured to be electrically coupled to a third voltage that is different from the first voltage and the second voltage, a drain terminal, a primary gate configured to be electrically coupled to the second voltage, a secondary gate in the second n-well, and a secondary gate contact on the secondary gate, the secondary gate electrically coupled to the primary gate and to the second voltage through the secondary gate contact, the primary and secondary gates being accessible from a front side of the silicon substrate. - View Dependent Claims (7, 8, 9, 10)
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11. A device, comprising:
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a silicon-on-insulator substrate including a buried oxide layer over a first doped region and a second doped region, the first and second doped regions having a same conductivity type and being physically separate from one another; a NMOS dual gate transistor including; a source region on the buried oxide layer; a drain region on the buried oxide layer; a channel region on the buried oxide layer and positioned between the source region and the drain region; a primary gate overlying the channel region; a secondary gate in the first doped region; and a secondary gate contact on the first doped region and in abutting contact with the buried oxide layer, the secondary gate contact being electrically coupled to the primary gate and the secondary gate; and a PMOS dual gate transistor including; a source region on the buried oxide layer; a drain region on the buried oxide layer; a channel region on the buried oxide layer and positioned between the source region and the drain region; a primary gate overlying the channel region; a secondary gate in the second doped region; and a secondary gate contact on the second doped region and in abutting contact with the buried oxide layer, the secondary gate contact being electrically coupled to the primary gate and the secondary gate. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification