Epitaxial lift-off processed GaAs thin-film solar cells integrated with non-tracking mini-compound parabolic concentrators

• US 10,141,465 B2
• Filed: 04/06/2015
• Issued: 11/27/2018
• Est. Priority Date: 04/04/2014
• Status: Active Grant

• Current Assignee: Board of Regents of the University of Michigan (University of Michigan)
• Original Assignee: Board of Regents of the University of Michigan (University of Michigan)
• Inventors: Lee, Kyusang, Forrest, Stephen R.
• Primary Examiner(s): Mulpuri, Savitr
• Application Number:
  US15/126,592
• Publication Number:
  US 20170084769A1
• Time in Patent Office: 1,331 Days
• CPC Class Codes: G02B 19/0042 for use with direct solar radiation
• CPC Class Codes: H01L 31/0203 Containers; Encapsulations , e.g. encapsulation of photodiodesfor photovoltaic devices H01L31/048; for organic photosensitive devices H10K30/80
• CPC Class Codes: H01L 31/0304 including, apart from doping materials or other impurities, only AIIIBV compounds
• CPC Class Codes: H01L 31/03926 comprising a flexible substrate
• CPC Class Codes: H01L 31/0445 including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
• CPC Class Codes: H01L 31/0547 comprising light concentrating means of the reflecting type, e.g. parabolic mirrors, concentrators using total internal reflection
• CPC Class Codes: H01L 31/0693 the devices including, apart from doping material or other impurities, only AIIIBV compounds, e.g. GaAs or InP solar cells
• CPC Class Codes: H01L 31/184 the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
• CPC Class Codes: H01L 31/1892 methods involving the use of temporary, removable substrates
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy
• CPC Class Codes: Y02E 10/52 PV systems with concentrators
• CPC Class Codes: Y02E 10/544 Solar cells from Group III-V materials

Abstract

There is disclosed a method of preparing a photovoltaic device. In particular, the method comprises making thin-film GaAs solar cells integrated with low-cost, thermoformed, lightweight and wide acceptance angle mini-CPCs. The fabrication combines ND-ELO thin film cells that are cold-welded to a foil substrate, and subsequently attached to the CPCs in an adhesive-free transfer printing process. There is also disclosed an improved photovoltaic device made by the disclosed method. The improved photovoltaic device comprises a thin-film solar integrated with non-tracking mini-compound parabolic concentrators, wherein the plastic compound parabolic concentrator comprise two parabolas tilted at an angle equal to the acceptance angle of the compound parabolic concentrator.

Claims

1. A method for integrating a thin-film solar cell with non-tracking miniconcentrators, said method comprising:

providing a growth substrate;

depositing at least one protection layer on the growth substrate;

depositing at least one sacrificial layer on the at least one protection layer;

depositing a photoactive cell on the sacrificial layer, wherein the photoactive cell is inverted;

forming a patterned metal layer comprising an array of mesas on the photoactive cell by a photolithography method, wherein the mesas are separated by one or more trenches that extend through the patterned metal layer and the photoactive cell to the sacrificial layer;

bonding the patterned metal layer to a metallized surface of a plastic sheet;

etching the sacrificial layer with one or more etch steps that remove the photoactive cell from the growth substrate to form thin film solar cells bonded to the plastic sheet;

dicing the thin film solar cells bonded to the plastic sheet along the one or more trenches;

fabricating compound parabolic concentrators from a plastic material; and

transferring the thin film solar cells onto the compound parabolic concentrators by an adhesive-free bonding step to form an integrated thin film solar cell and compound parabolic concentrator.

2. The method of claim 1, wherein the growth substrate comprises GaAs or InP.

3. The method of claim 1, wherein the at least one protection layer is lattice matched with the growth substrate.

4. The method of claim 3, wherein the at least one protection layer is selected from AlAs, GaAs, InP, InGaAs, AlInP, GaInP, InAs, InSb, GaP, AlP, GaSb, AlSb, and combinations thereof.

5. The method of claim 1, wherein at least one of the protection layer, sacrificial layer, or photoactive cell is deposited by at least one process chosen from gas source molecular beam epitaxy (GSMBE), metallo-organic chemical vapor deposition (MOCVD), hydride vapor phase epitaxy (HVPE), solid source molecular beam epitaxy (SSMBE), and chemical beam epitaxy.

6. The method of claim 1, wherein the at least one protection layer comprises a buffer layer, an etch-stop layer, or combinations thereof.

7. The method of claim 1, wherein said photolithography method comprises depositing a metal layer on the photoactive cell;

depositing a mask on top of the metal layer for mesa etching; and

performing at least one etch step through said mask to form the mesas separated by the one or more trenches.

8. The method of claim 7, wherein the at least one etch step comprises etching the metal layer and the photoactive cell with a wet etchant, a dry etchant, or combinations thereof.

9. The method of claim 8, wherein said wet etchant comprises HF, H₃PO₄, HCl, H₂SO₄, H₂O₂, HNO₃, C₆H₈O₇, and combinations thereof, including combinations with H₂O.

10. The method of claim 8, wherein said dry etchant comprises reactive ion etching (RIE) with a plasma.

11. The method of claim 1, wherein the sacrificial layer comprises AlAs, and the one or more etch steps comprise contacting said AlAs with HF.

12. The method of claim 1, wherein the one or more trenches have a width ranging from 100 μ

m to 500 μ

m.

13. The method of claim 1, wherein the photoactive cell comprises a multi-junction cell.

14. The method of claim 1, wherein the step of bonding the patterned metal layer to the plastic sheet comprises a direct attachment method selected from cold-welding, thermally assisted cold-welding, and thermocompression bonding.

15. The method of claim 1, wherein the thin film solar cells bonded to the plastic sheet are diced using a laser.

16. The method of claim 15, wherein the laser is a CO₂ laser.

17. The method of claim 1, wherein transferring the thin film solar cells onto the compound parabolic concentrators comprises attaching the thin-film solar cells to an elastomeric stamp and transfer printing the solar cells onto a metallized surface of the compound parabolic concentrators.

18. The method of claim 17, wherein the metalized surface of the compound parabolic concentrators comprises at least one metal chosen from Au, Ag, Pt, Pd, Ni, and Cu.

19. The method of claim 1, wherein the plastic material has a glass transition temperature below 100°

C.

20. The method of claim 1, wherein the plastic material comprises polyethylene terephthalate glycol-modified.

21. The method of claim 1, wherein fabricating the compound parabolic concentrators comprises at least one thermoforming process, wherein the at least one thermoforming process comprises mounting the plastic material on a negative compound-parabola shaped vacuum mold.

22. The method of claim 21, wherein a vacuum is used to pull the plastic material to the surface of the mold, to conform the plastic material to the shape of the mold while the plastic material is heated above its glass transition temperature.

23. The method of claim 22, wherein the plastic material is subsequently cooled to room temperature where it holds its shape as a compound parabola.

24. The method of claim 1, wherein the plastic material is coated with at least one wetting layer and at least one metal reflecting layer.

25. The method of claim 24, wherein the at least one wetting layer comprises Ge.

26. The method of claim 24, wherein the at least one metal reflecting layer comprises Ag.

27. The method of claim 24, wherein the at least one wetting layer and the at least one metal reflecting layer are deposited using electron-beam, thermal evaporation, or combinations thereof.