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Micro-electro-mechanical device and manufacturing process thereof

  • US 10,150,666 B2
  • Filed: 05/23/2017
  • Issued: 12/11/2018
  • Est. Priority Date: 11/19/2015
  • Status: Active Grant
First Claim
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1. A micro-electro-mechanical device, comprising:

  • a monolithic body of semiconductor material;

    a first buried cavity in the monolithic body of semiconductor material;

    a sensitive region in the monolithic body facing the first buried cavity; and

    a decoupling trench extending into the monolithic body as far as the first buried cavity, the decoupling trench decoupling the sensitive region from a peripheral portion of the monolithic body and forming the sensitive region.

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