Inspection device

• US 10,157,722 B2
• Filed: 06/28/2016
• Issued: 12/18/2018
• Est. Priority Date: 03/15/2011
• Status: Active Grant

• Current Assignee: Ebara Corporation
• Original Assignee: Ebara Corporation
• Inventors: Hatakeyama, Masahiro, Yoshikawa, Shoji, Murakami, Takeshi, Watanabe, Kenji, Naito, Yoshihiko, Toma, Yasushi, Karimata, Tsutomu, Hayashi, Takehide, Tsukamoto, Kiwamu, Kohama, Tatsuya, Kobayashi, Noboru
• Primary Examiner(s): Logie, Michael J
• Application Number:
  US15/195,665
• Publication Number:
  US 20160307726A1
• Time in Patent Office: 903 Days
• Field of Search: None
• CPC Class Codes: G01N 2223/611 patterned objects; electronic devices
• CPC Class Codes: G01N 23/223 by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
• CPC Class Codes: G01N 23/2251 using incident electron beams, e.g. scanning electron microscopy [SEM]
• CPC Class Codes: H01J 1/34 Photo-emissive cathodes H01J1/35 takes precedence
• CPC Class Codes: H01J 2237/0048 Charging arrangements
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 2237/032 Mounting or supporting
• CPC Class Codes: H01J 2237/038 Insulating
• CPC Class Codes: H01J 2237/045 Diaphragms
• CPC Class Codes: H01J 2237/0458 movable, i.e. for changing between differently sized apertures
• CPC Class Codes: H01J 2237/0473 accelerating
• CPC Class Codes: H01J 2237/0492 Lens systems
• CPC Class Codes: H01J 2237/061 Construction
• CPC Class Codes: H01J 2237/06333 Photo emission
• CPC Class Codes: H01J 2237/166 Sealing means
• CPC Class Codes: H01J 2237/186 Valves
• CPC Class Codes: H01J 2237/2002 Controlling environment of sample
• CPC Class Codes: H01J 2237/2007 Holding mechanisms
• CPC Class Codes: H01J 2237/2008 specially adapted for studying electrical or magnetical properties of objects
• CPC Class Codes: H01J 2237/2448 Secondary particle detectors
• CPC Class Codes: H01J 2237/2482 : Optical means
• CPC Class Codes: H01J 2237/2485 : Electric or electronic means
• CPC Class Codes: H01J 2237/2817 : Pattern inspection
• CPC Class Codes: H01J 2237/2855 : Photo-emission
• CPC Class Codes: H01J 2237/2857 : Particle bombardment induced emission
• CPC Class Codes: H01J 37/073 : Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/09 : Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/10 : Lenses
• CPC Class Codes: H01J 37/20 : Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
• CPC Class Codes: H01J 37/222 : Image processing arrangements associated with the tube
• CPC Class Codes: H01J 37/244 : Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/265 : Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
• CPC Class Codes: H01J 37/28 : with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/29 : Reflection microscopes

Abstract

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Claims

1. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube;

wherein the potential of the first tube is a high voltage; and

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and

wherein the numerical aperture has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

2. The photoelectron generation device according to claim 1 wherein

the lens extracts the photoelectrons generated from the photoelectron surface in the opposite direction from the light source.

3. The photoelectron generation device according to claim 2 further comprising:

a field aperture arranged between the light source and the photoelectron surface, and the field aperture being passed through by the light.

4. The photoelectron generation device according to claim 1 wherein

the light is irradiated to the photoelectron surface from the lens side.

5. The photoelectron generation device according to claim 4 further comprising:

a masking material including a hole part, and coated onto the lens side of the photoelectron surface.

6. The photoelectron generation device according to claim 5 further comprising:

a reflection surface structure reflecting the light passing through the hole part and the photoelectron surface, and arranged so that the reflected light passes through the hole part and the photoelectron surface.

7. The photoelectron generation device according to claim 4 further comprising:

a mirror arranged between the light source and the photoelectron surface, reflecting the light, and including a hole, the photoelectrons passing through the hole.

8. The photoelectron generation device according to claim 1 further comprising:

an aligner arranged between the lens and the numerical aperture.

9. The photoelectron generation device according to claim 1 wherein

the second tube is set to the potential as a potential of the inspection object.

10. The photoelectron generation device according to claim 1 wherein

the light source is arranged on an atmosphere side, and

the photoelectron surface, the lens and the numerical aperture are arranged on a vacuum side.

11. The photoelectron generation device according to claim 1 wherein

the light is a laser.

12. A primary optical system comprising:

the photoelectron generation device according to claim 1; and

a lens controlling a size of the primary beam.

13. An inspection device comprising:

a primary optical system including the photoelectron generation device according to claim 1;

a secondary optical system including a detector detecting a secondary beam generated from the inspection object irradiated with the primary beam; and

an image processing system forming an image based on the secondary beam detected by the detector.

14. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube;

wherein the potential of the first tube is a high voltage; and

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam;

wherein the lens has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

15. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube;

wherein the potential of the first tube is a high voltage;

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and

a cathode lens arranged between the numerical aperture and the inspection object, wherein the cathode lens is arranged inside of the first tube.