Electro-optical apparatus and electronic device

• US 10,168,533 B2
• Filed: 12/03/2015
• Issued: 01/01/2019
• Est. Priority Date: 12/25/2014
• Status: Active Grant

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Koshihara, Takeshi
• Primary Examiner(s): Quarterman, Kevin
• Application Number:
  US14/958,258
• Publication Number:
  US 20160190520A1
• Time in Patent Office: 1,125 Days
• CPC Class Codes: G02B 27/0172 characterised by optical features
• CPC Class Codes: G02B 30/22 of the stereoscopic type
• CPC Class Codes: H10K 50/818 Reflective anodes, e.g. ITO combined with thick metallic layers
• CPC Class Codes: H10K 50/852 comprising a resonant cavity structure, e.g. Bragg reflector pair
• CPC Class Codes: H10K 50/856 comprising reflective means
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/35 comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 59/80518 Reflective anodes, e.g. ITO combined with thick metallic layers
• CPC Class Codes: H10K 59/876 comprising a resonant cavity structure, e.g. Bragg reflector pair
• CPC Class Codes: H10K 59/878 comprising reflective means

Abstract

There is provided an electro-optical apparatus including an element substrate that includes a display region in which a plurality of pixels, which are light-emitting elements, are arranged in a matrix form. The light-emitting element has a structure in which a reflective electrode, a protective layer, an optical path adjustment layer, a first electrode, a light-emitting layer, and a second electrode are laminated on an insulation layer. The reflective electrode is disposed by being split in each pixel, and a gap is formed between each reflective electrode that is disposed by being split in each pixel. The protective layer covers the surface of the reflective electrode on which the gap is formed, and includes an embedded insulation film which is embedded in the gap.

Claims

1. An electro-optical apparatus comprising:

an element substrate that includes a display region in which a plurality of pixels are arranged in a matrix form,

wherein the element substrate has a light-emitting element and a transistor which drives the light-emitting element in each pixel,

wherein the light-emitting element is disposed via an insulation layer above the transistor, and has a structure in which a reflective electrode, a protective layer, an optical path adjustment layer, a first electrode, a light-emitting layer, and a second electrode are laminated,

wherein the reflective electrode is disposed by being split in each pixel,

wherein a gap is formed between each reflective electrode that is disposed by being split in each pixel,

wherein the protective layer covers the surface on which the reflective electrode is disposed, and includes an embedded insulation film which is embedded in the gap, and

wherein a reflection enhancing layer is disposed on the surface of the reflective electrode so as to directly contact the surface of the reflective electrode.

2. The electro-optical apparatus according to claim 1,

wherein the transistor and the reflective electrode are electrically connected via a first contact electrode which is disposed so as to pass through the insulation layer, and

the reflective electrode and the first electrode are electrically connected via a second contact electrode which is disposed so as to pass through the protective layer.

3. The electro-optical apparatus according to claim 2, the protective layer further comprising:

a first insulation film which is provided between the reflective electrode and the embedded insulation film; and

a second insulation film which is provided on the first insulation film and the embedded insulation film,

wherein the optical path adjustment layer is disposed such that an end section of at least a portion thereof is positioned on the surface of the second insulation film.

4. The electro-optical apparatus according to claim 3,

wherein the second insulation film contains silicon nitride, and

the optical path adjustment layer contains silicon oxide.

5. The electro-optical apparatus according to claim 3,

wherein an end section of at least a portion of the optical path adjustment layer is positioned above the embedded insulation film.

6. The electro-optical apparatus according to claim 2,

wherein a contact hole is formed which passes through the optical path adjustment layer and the protective layer, and

the second contact electrode has a first contact section which is connected to the reflective electrode in a state of being embedded in the contact hole, and a second contact section which is connected to the first electrode in a state of being disposed on the surface of the protective layer.

7. The electro-optical apparatus according to claim 6,

wherein an end section of at least a portion of the optical path adjustment layer is positioned on the surface of the second contact section.

8. An electronic device comprising:

the electro-optical apparatus according to claim 1.

9. An electronic device comprising:

the electro-optical apparatus according to claim 2.

10. An electronic device comprising:

the electro-optical apparatus according to claim 3.

11. An electronic device comprising:

the electro-optical apparatus according to claim 4.

12. An electronic device comprising:

the electro-optical apparatus according to claim 5.

13. An electronic device comprising:

the electro-optical apparatus according to claim 6.

14. An electro-optical apparatus having a first pixel and a second pixel, the electro-optical apparatus comprising:

a substrate;

a counter electrode;

a light-emitting layer disposed between the counter electrode and the substrate;

an optical path adjustment layer disposed between the light-emitting layer and the substrate;

a protective layer disposed between the optical path adjustment layer and the substrate;

a first reflective electrode disposed between the protective layer and the substrate in the first pixel;

a first pixel electrode disposed between the light-emitting layer and the optical path adjustment layer in the first pixel;

a second reflective electrode disposed between the protective layer and the substrate in the second pixel, the surface of the first reflective electrode and second reflective electrode being covered by the protective layer;

a second pixel electrode disposed between the light-emitting layer and the optical path adjustment layer in the second pixel;

an embedded insulation film disposed between the first reflective electrode and second reflective electrode,

wherein a reflection enhancing layer is disposed on the surface of at least one of the first reflective electrode and the second reflective electrode so as to directly contact the surface of the at least one of the first reflective electrode and the second reflective electrode.

15. The electro-optical apparatus according to claim 14,

wherein the embedded insulation film is disposed between the protective layer and at least part of the optical path adjustment layer.

16. The electro-optical apparatus according to claim 14,

wherein an end section of at least a portion of the optical path adjustment layer is positioned above the embedded insulation film.

17. An electronic device comprising:

the electro-optical apparatus according to claim 14.

18. An electronic device comprising:

the electro-optical apparatus according to claim 15.

19. An electronic device comprising:

the electro-optical apparatus according to claim 16.