Optical element and exposure apparatus

• US 10,175,584 B2
• Filed: 10/17/2013
• Issued: 01/08/2019
• Est. Priority Date: 08/26/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shirai, Takeshi, Kokubun, Takao, Ishizawa, Hitoshi, Murakami, Atsunobu
• Primary Examiner(s): Rakowski, Cara E
• Application Number:
  US14/056,418
• Publication Number:
  US 20140043592A1
• Time in Patent Office: 1,909 Days
• Field of Search: 355 53, 359665
• CPC Class Codes: G02B 1/105 Protective coatings
• CPC Class Codes: G02B 1/14 Protective coatings, e.g. hard coatings
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate'"'"'s side of the projection optical system.

Claims

1. An exposure apparatus that exposes a substrate with exposure beam via liquid, comprising:

a projection optical system that has a plurality of optical elements and a lens barrel that holds the optical elements, the optical elements having a lens, which is located at a closest position to an image plane among the optical elements;

a nozzle member that is arranged at a surrounding of the lens to form a liquid immersion region below the projection optical system with the liquid; and

a stage that is arranged below the projection optical system and the nozzle member and that holds the substrate, wherein

the lens has;

an exit surface via which the exposure beam is transmitted, the exit surface being arranged to be in contact with the liquid of the liquid immersion region;

a downward-facing surface that is arranged farther, from the stage in a direction along an optical axis of the projection optical system, than the exit surface;

a protruding part, through which the exposure beam is transmitted, that protrudes toward the stage with respect to the downward-facing surface in the direction along the optical axis, the protruding part including the exit surface; and

a thin film that is formed at a portion, via which the exposure beam is not transmitted onto the substrate, of the protruding part different from the exit surface,

at least a part of the protruding part is arranged lower than the lens barrel in the direction along the optical axis,

a side surface of the protruding part is arranged between the downward-facing surface and the exit surface in the direction along the optical axis,

the nozzle member has an inward surface, the inward surface extending to surround the protruding part and being arranged facing the side surface of the protruding part,

the nozzle member has an upper surface, the upper surface being arranged underneath the downward-facing surface and extending in a radial direction,

a corner part of the nozzle member arranged between the upper surface and the inward surface is arranged adjacent to the side surface of the protruding part in the radial direction, and

in the exposure process for the substrate via the projection optical system and the liquid immersion region, the substrate held on the stage is arranged to face the projection optical system and is moved relative to the liquid immersion region while the liquid immersion region is locally formed between the lens and a local part of a surface of the substrate.

2. The exposure apparatus according to claim 1,

wherein the exit surface is substantially plane, and

wherein the lens is arranged such that the exit surface is substantially parallel to a predetermined plane that is orthogonal to the optical axis of the projection optical system.

3. The exposure apparatus according to claim 2,

wherein the exit surface of the lens is substantially flat.

4. The exposure apparatus according to claim 3,

wherein the side surface of the protruding part is an inclined surface.

5. The exposure apparatus according to claim 4,

wherein the side surface of the protruding part extends upwardly and radially with respect to the exit surface.

6. The exposure apparatus according to claim 5,

wherein the protruding part has a shape, a width of which is gradually reduced toward the exit surface.

7. The exposure apparatus according to claim 4,

wherein the thin film is arranged such that contact of the thin film with the liquid is not precluded.

8. The exposure apparatus according to claim 7,

wherein the lens is arranged such that an incident surface of the lens intersects with the optical axis of the projection optical system.

9. The exposure apparatus according to claim 8,

wherein the lens is arranged such that the exit surface intersects with the optical axis of the projection optical system.

10. The exposure apparatus according to claim 7,

wherein a lower surface of the nozzle member is located lower than the exit surface.

11. The exposure apparatus according to claim 10,

wherein liquid is supplied to the liquid immersion region via the nozzle member and liquid is collected from the liquid immersion region via the nozzle member, and

wherein the substrate is irradiated with the exposure beam via the liquid of the liquid immersion region, which is locally formed on the substrate.

12. The exposure apparatus according to claim 11,

wherein the substrate is subjected to a scanning exposure,

wherein a projection area, onto which a pattern image is projected via the projection optical system and the liquid, has a length in a first direction orthogonal to an optical axis of the projection optical system and a length in a second direction orthogonal to the first direction and to the optical axis, the length in the first direction being smaller than the length in the second direction, and

wherein, during the scanning exposure, the substrate is relatively moved with respect to the projection area in the first direction.

13. The exposure apparatus according to claim 12,

wherein the protruding part is formed such that the exit surface has a length in the first direction that is smaller than a length in the second direction.

14. The exposure apparatus according to claim 7,

wherein the lens has a different surface from the exit surface, the thin film being formed on the different surface.

15. The exposure apparatus according to claim 14,

wherein the thin film is formed on the side surface of the protruding part.

16. The exposure apparatus according to claim 15,

wherein the thin film has a light-shielding function.

17. The exposure apparatus according to claim 16,

wherein the thin film is part of a multilayer film, and the multilayer film has at least one of a protective function and the light shielding function.

18. A method of exposing a substrate with exposure beam via liquid, the method comprising:

positioning the substrate held on a stage below a projection optical system, the projection optical system having a plurality of optical elements and a lens barrel that holds the optical elements, the optical elements having a lens, which is located at a closest position to an image plane among the optical elements; and

irradiating the substrate with the exposure beam via the projection optical system and a liquid immersion region while the stage is arranged below the projection optical system and a nozzle member, the liquid immersion region being formed with the liquid below the projection optical system by use of the nozzle member that is arranged at a surrounding of the lens, wherein

the lens has;

an exit surface via which the exposure beam is transmitted, the exit surface being arranged to be in contact with the liquid of the liquid immersion region;

a downward-facing surface that is arranged farther, from the stage in a direction along an optical axis of the projection optical system, than the exit surface;

a protruding part, through which the exposure beam is transmitted, that protrudes toward the stage with respect to the downward-facing surface in the direction along the optical axis, the protruding part including the exit surface; and

a thin film that is formed at a portion, via which the exposure beam is not transmitted onto the substrate, of the protruding part different from the exit surface,

at least a part of the protruding part is arranged lower than the lens barrel in the direction along the optical axis,

a side surface of the protruding part is arranged between the downward-facing surface and the exit surface in the direction along the optical axis,

the nozzle member has an inward surface, the inward surface extending to surround the protruding part and being arranged facing the side surface of the protruding part,

the nozzle member has an upper surface, the upper surface being arranged underneath the downward-facing surface and extending in a radial direction,

a corner part of the nozzle member arranged between the upper surface and the inward surface is arranged adjacent to the side surface of the protruding part in the radial direction, and

in the exposure process for the substrate via the projection optical system and the liquid of the liquid immersion region, the substrate held on the stage is arranged to face the projection optical system and is moved relative to the liquid immersion region while the liquid immersion region is locally formed between the lens and a local part of a surface of the substrate.

19. The method according to claim 18,

wherein the exit surface is substantially plane, and

wherein the lens is arranged such that the exit surface is substantially parallel to a predetermined plane that is orthogonal to the optical axis of the projection optical system.

20. The method according to claim 19,

wherein the exit surface of the lens is substantially flat.

21. The method according to claim 20,

wherein the side surface of the protruding part is an inclined surface.

22. The method according to claim 21,

wherein the side surface of the protruding part extends upwardly and radially with respect to the exit surface.

23. The method according to claim 22,

wherein the protruding part has a shape, a width of which is gradually reduced toward the exit surface.

24. The method according to claim 21,

wherein the thin film is arranged such that contact of the thin film with the liquid is not precluded.

25. The method according to claim 24,

wherein the lens is arranged such that an incident surface of the lens intersects with the optical axis of the projection optical system.

26. The method according to claim 25,

wherein the lens is arranged such that the exit surface intersects with the optical axis of the projection optical system.

27. The method according to claim 24,

wherein a lower surface of the nozzle member is located lower than the exit surface.

28. The method according to claim 27,

wherein liquid is supplied to the liquid immersion region via the nozzle member and liquid is collected from the liquid immersion region via the nozzle member, and

wherein the substrate is irradiated with the exposure beam via the liquid of the liquid immersion region, which is locally formed on the substrate.

29. The method according to claim 28,

wherein the substrate is subjected to a scanning exposure,

wherein a projection area, onto which a pattern image is projected via the projection optical system and the liquid, has a length in a first direction orthogonal to an optical axis of the projection optical system and a length in a second direction orthogonal to the first direction and to the optical axis, the length in the first direction being smaller than the length in the second direction, and

wherein, during the scanning exposure, the substrate is relatively moved with respect to the projection area in the first direction.

30. The method according to claim 29,

wherein the protruding part is formed such that the exit surface has a length in the first direction that is smaller than a length in the second direction.

31. The method according to claim 24,

wherein the lens has a different surface from the exit surface, the thin film being formed on the different surface.

32. The method according to claim 31,

wherein the thin film is formed on the side surface of the protruding part.

33. The method according to claim 32,

wherein the thin film has a light-shielding function.

34. The method according to claim 33,

wherein the thin film is part of a multilayer film, and the multilayer film has at least one of a protective function and the light shielding function.