Method for manufacturing magnetic memory cells
First Claim
1. A method for manufacturing a memory cell that includes a magnetic memory element electrically connected to a selection element comprising a two-terminal selector, the method comprising the steps of:
- depositing a magnetic memory element film stack for the magnetic memory element on a substrate;
depositing a selector film stack for the two-terminal selector on top of the magnetic memory element film stack, the selector film stack including a first electrode film and a second electrode film with a switching layer film interposed therebetween;
etching the selector film stack with an etch mask formed thereon to remove at least a first portion of the switching layer film not covered by the etch mask to form a selector pillar that includes a second portion of the switching layer film;
depositing a first conforming dielectric layer over the selector pillar, including a sidewall thereof, and surrounding surface;
etching a portion of the first conforming dielectric layer covering the surrounding surface to form a first protective sleeve around at least the second portion of the switching layer film of the selector pillar; and
etching the magnetic memory element film stack using the etch mask and the first protective sleeve as a composite mask to form a memory cell pillar.
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0 Petitions
Accused Products
Abstract
The present invention is directed to a method for manufacturing a memory cell that includes a magnetic memory element electrically connected to a two-terminal selector. The method includes the steps of depositing a magnetic memory element film stack on a substrate; depositing a selector film stack on top of the magnetic memory element film stack; etching the selector film stack with an etch mask formed thereon to remove at least a switching layer in the selector film stack not covered by the etch mask, thereby forming a selector pillar; depositing a first conforming dielectric layer over the selector pillar and surrounding surface; etching a portion of the first conforming dielectric layer covering the surrounding surface to form a first protective sleeve around at least the switching layer of the selector pillar; and etching the magnetic memory element film stack using the etch mask and the first protective sleeve as a composite mask to form a memory cell pillar.
5 Citations
12 Claims
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1. A method for manufacturing a memory cell that includes a magnetic memory element electrically connected to a selection element comprising a two-terminal selector, the method comprising the steps of:
- depositing a magnetic memory element film stack for the magnetic memory element on a substrate;
depositing a selector film stack for the two-terminal selector on top of the magnetic memory element film stack, the selector film stack including a first electrode film and a second electrode film with a switching layer film interposed therebetween;
etching the selector film stack with an etch mask formed thereon to remove at least a first portion of the switching layer film not covered by the etch mask to form a selector pillar that includes a second portion of the switching layer film;
depositing a first conforming dielectric layer over the selector pillar, including a sidewall thereof, and surrounding surface;
etching a portion of the first conforming dielectric layer covering the surrounding surface to form a first protective sleeve around at least the second portion of the switching layer film of the selector pillar; and
etching the magnetic memory element film stack using the etch mask and the first protective sleeve as a composite mask to form a memory cell pillar. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
- depositing a magnetic memory element film stack for the magnetic memory element on a substrate;
Specification