Lithographic apparatus and device manufacturing method

• US 10,180,629 B2
• Filed: 12/20/2016
• Issued: 01/15/2019
• Est. Priority Date: 06/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catherinus Hubertus, Ritsema, Roelof Aeilko Siebranc, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Streefkerk, Bob, Bijlaart, Erik Theodorus Maria, Hoogendam, Christian Alexander, Van Santen, Helmar, Van De Kerkhof, Marcus Adrianus, Kroon, Mark, Den Boef, Arie Jeffrey, Ottens, Joost Jeroen, Mertens, Jeroen Johannes Sophia Maria
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US15/385,584
• Publication Number:
  US 20170102621A1
• Time in Patent Office: 756 Days
• Field of Search: 355 30, 355 53
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a radiation-sensitive substrate;

a projection system configured to project an exposure beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table, with a liquid;

a part of a sensor system, the sensor system part capable of being positioned to be illuminated by radiation;

an edge member structure configured to at least partly extend along an edge of the sensor system part and along an edge of the substrate when supported on the substrate table, the edge member structure configured to define a first gap, between the edge member structure and the sensor system part, to receive at least part of the liquid and define a second gap, between the edge member and the substrate when supported on the substrate table, to receive at least part of the liquid; and

an upwardly-facing orifice, located below the first gap, configured to drain liquid entering the first gap.

2. The apparatus of claim 1, wherein the substrate table comprises a port configured to remove liquid entering the second gap.

3. The apparatus of claim 1, wherein the edge member structure is configured to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor system part.

4. The apparatus of claim 1, wherein the sensor system part is configured to be in contact with the liquid and the sensor system part is arranged to be illuminated by radiation arranged to come from a part of a measurement system located above the substrate table.

14. The apparatus of claim 1, wherein the sensor system part comprises a grating-type structure.

15. The apparatus of claim 1, wherein the orifice is located underneath at least part of the edge member structure and defined in an upwardly facing surface.

16. The apparatus of claim 1, wherein the edge member structure is movably separate from the substrate table.

17. The apparatus of claim 1, wherein the liquid supply system is configured to substantially confine the liquid onto a localized area having a size smaller than the area of the substrate.

18. The apparatus of claim 1, wherein the liquid supply system further comprises a liquid confinement structure to at least partly confine the liquid in the space, the liquid confinement structure comprising:

an outlet, in a bottom surface of the liquid confinement structure, configured to remove at least part of the liquid from the space, and

an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the substrate when supported on the substrate table, the aperture configured to allow the liquid to flow therethrough between above the aperture and below the aperture and the aperture configured to allow the radiation beam to pass therethrough.

19. The apparatus of claim 1, wherein the edge member structure surrounds the substrate when supported on the substrate table and is arranged to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate when supported on the substrate table.

20. The apparatus of claim 1, further comprising a chamber into which the orifice opens, the chamber further comprising an opening to drain liquid out of the chamber, cross-sections of the orifice and the opening being smaller than a cross-section of the chamber.

5. A device manufacturing method comprising:

at least partly filling a space between a projection system of a lithographic apparatus and an object on a substrate table, with a liquid;

projecting radiation onto a part of a sensor system, wherein an edge member structure at least partly extends along an edge of the sensor system part and along an edge of a radiation-sensitive substrate, the edge member structure configured to define a first gap, between the edge member structure and the sensor system part, to receive at least part of the liquid and define a second gap, between the edge member and the substrate, to receive at least part of the liquid;

draining liquid entering the first gap using an orifice located below the first gap; and

projecting an exposure beam of radiation using the projection system through the liquid onto a target portion of the substrate.

6. A lithographic projection apparatus comprising:

a movable table;

a projection system configured to project an exposure beam onto a target portion of a radiation-sensitive substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the table, with a liquid;

a sensor system part of the table, the sensor system part capable of being positioned to be illuminated by radiation from a part of a measurement system located above the table;

an edge member structure on the table, the edge member structure configured to at least partly extend along an edge of the sensor system part and to define a gap, between the edge member structure and the sensor system part, to receive at least part of the liquid, wherein the edge member structure is movable relative to the movable table; and

an upwardly-facing orifice, located below the gap, configured to drain liquid entering the gap.

7. The apparatus of claim 6, wherein the sensor system part comprises a grating-type structure.

8. The apparatus of claim 6, wherein the orifice is located underneath at least part of the edge member structure.

9. The apparatus of claim 6, wherein the edge member structure further surrounds the substrate when supported on the table and is arranged to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate when supported on the table.

10. The apparatus of claim 6, further comprising a chamber into which the orifice opens, the chamber further comprising an opening to drain liquid out of the chamber, cross-sections of the orifice and the opening being smaller than a cross-section of the chamber.

11. The apparatus of claim 6, wherein the orifice is connected to a passage passing through the substrate table, at least part of the passage extending horizontally.

12. The apparatus of claim 6, wherein the liquid supply system is configured to substantially confine the liquid onto a localized area having a size smaller than the area of the substrate.

13. The apparatus of claim 6, wherein the liquid supply system further comprises a liquid confinement structure to at least partly confine the liquid in the space, the liquid confinement structure comprising:

an outlet, in a bottom surface of the liquid confinement structure, configured to remove at least part of the liquid from the space, and

an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the table, the aperture configured to allow the liquid to flow therethrough between above the aperture and below the aperture and the aperture configured to allow the radiation beam to pass therethrough.