Optoelectronic device
First Claim
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1. An optoelectronic device, comprising:
- a substrate;
a regrown cladding layer, on the substrate;
an insulating layer;
an optically active region, above the regrown cladding layer;
a first waveguide; and
a second waveguide,wherein;
the regrown cladding layer has a refractive index which is less than a refractive index of the optically active region, such that an optical mode of the optoelectronic device is confined to the optically active region,the optically active region is formed of;
SiGeSn, GeSn, InGaNAs, or InGaNAsSb,the insulating layer is directly on the substrate, over a first region of the substrate,the regrown cladding layer is on the substrate, over a second region of the substrate, different from the first region of the substrate,the first waveguide is on the insulating layer,the second waveguide is in the optically active region,the substrate is a silicon substrate,the insulating layer is an oxide layer,the first waveguide is over the first region of the substrate and extends to a boundary between the first region of the substrate and the second region of the substrate,the second waveguide is over the second region of the substrate and extends to the boundary between the first region of the substrate and the second region of the substrate,the first waveguide is configured to support a first optical mode, andthe second waveguide is configured to support a second optical mode, coupled to the first optical mode.
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Abstract
An optoelectronic device and method of making the same. The device comprising: a substrate; a regrown cladding layer, on top of the substrate; and an optically active region, above the regrown cladding layer; wherein the regrown cladding layer has a refractive index which is less than a refractive index of the optically active region, such that an optical mode of the optoelectronic device is confined to the optically active region, and wherein the optically active region is formed of: SiGeSn, GeSn, InGaNAs, or InGaNAsSb.
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Citations
39 Claims
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1. An optoelectronic device, comprising:
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a substrate; a regrown cladding layer, on the substrate; an insulating layer; an optically active region, above the regrown cladding layer; a first waveguide; and a second waveguide, wherein; the regrown cladding layer has a refractive index which is less than a refractive index of the optically active region, such that an optical mode of the optoelectronic device is confined to the optically active region, the optically active region is formed of;
SiGeSn, GeSn, InGaNAs, or InGaNAsSb,the insulating layer is directly on the substrate, over a first region of the substrate, the regrown cladding layer is on the substrate, over a second region of the substrate, different from the first region of the substrate, the first waveguide is on the insulating layer, the second waveguide is in the optically active region, the substrate is a silicon substrate, the insulating layer is an oxide layer, the first waveguide is over the first region of the substrate and extends to a boundary between the first region of the substrate and the second region of the substrate, the second waveguide is over the second region of the substrate and extends to the boundary between the first region of the substrate and the second region of the substrate, the first waveguide is configured to support a first optical mode, and the second waveguide is configured to support a second optical mode, coupled to the first optical mode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An optoelectronic device, formed on a silicon-on-insulator wafer comprising a substrate, an insulating layer, and a silicon-on-insulator layer, comprising:
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a cladding layer, formed of a different material from the material of the insulating layer, on the substrate; an optically active region, above the cladding layer and formed of SiGeSn, GeSn, InGaNAs, or InGaNAsSb; a first waveguide; and a second waveguide, wherein; the cladding layer has a refractive index which is less than a refractive index of the optically active region such that an optical mode of the optoelectronic device is highly confined inside the optically active region, the insulating layer does not extend below the optically active region, the insulating layer is directly on the substrate, over a first region of the substrate, the cladding layer is on the substrate, over a second region of the substrate, different from the first region of the substrate, the first waveguide is on the insulating layer, the second waveguide is in the optically active region, the substrate is a silicon substrate, the insulating layer is an oxide layer, the first waveguide is over the first region of the substrate and extends to a boundary between the first region of the substrate and the second region of the substrate, the second waveguide is over the second region of the substrate and extends to the boundary between the first region of the substrate and the second region of the substrate, the first waveguide is configured to support a first optical mode, and the second waveguide is configured to support a second optical mode, coupled to the first optical mode. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
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Specification