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Optoelectronic device

  • US 10,185,203 B1
  • Filed: 09/08/2017
  • Issued: 01/22/2019
  • Est. Priority Date: 07/05/2017
  • Status: Active Grant
First Claim
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1. An optoelectronic device, comprising:

  • a substrate;

    a regrown cladding layer, on the substrate;

    an insulating layer;

    an optically active region, above the regrown cladding layer;

    a first waveguide; and

    a second waveguide,wherein;

    the regrown cladding layer has a refractive index which is less than a refractive index of the optically active region, such that an optical mode of the optoelectronic device is confined to the optically active region,the optically active region is formed of;

    SiGeSn, GeSn, InGaNAs, or InGaNAsSb,the insulating layer is directly on the substrate, over a first region of the substrate,the regrown cladding layer is on the substrate, over a second region of the substrate, different from the first region of the substrate,the first waveguide is on the insulating layer,the second waveguide is in the optically active region,the substrate is a silicon substrate,the insulating layer is an oxide layer,the first waveguide is over the first region of the substrate and extends to a boundary between the first region of the substrate and the second region of the substrate,the second waveguide is over the second region of the substrate and extends to the boundary between the first region of the substrate and the second region of the substrate,the first waveguide is configured to support a first optical mode, andthe second waveguide is configured to support a second optical mode, coupled to the first optical mode.

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