Discrete source mask optimization

• US 10,191,384 B2
• Filed: 02/04/2014
• Issued: 01/29/2019
• Est. Priority Date: 02/25/2013
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Liu, Xiaofeng, Howell, Rafael C.
• Primary Examiner(s): Iacoletti, Michelle M
• Application Number:
  US14/766,703
• Publication Number:
  US 20150378262A1
• Time in Patent Office: 1,820 Days
• Field of Search: None
• CPC Class Codes: G03F 7/2008 characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(aⁿ) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.

Claims

1. A method comprising:

generating, by a computer device, an initial discrete pupil profile from a desired non-discrete pupil profile designed for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus;

selecting, using the computer device, a discrete change to the discrete pupil profile;

applying, by the computer device, the selected discrete change to the discrete pupil profile; and

generating electronic instructions, based on the discrete profile to which the selected discrete change has been applied, for use in configuring an optical component of, or for, a lithographic projection apparatus illumination system.

2. The method of claim 1, wherein the desired pupil profile is a pupil profile from an optimization or an empirical pupil profile.

3. The method of claim 1, wherein the discrete pupil profile is renderable by hardware of the lithographic projection apparatus illumination system.

4. The method of claim 3, wherein the hardware of the lithographic projection apparatus illumination system comprises an array of mirrors.

5. The method of claim 1, wherein the discrete pupil profile comprises intensities at a plurality of spatially discrete positions on a pupil plane.

6. The method of claim 1, further comprising optimizing design variables unassociated with the lithographic projection apparatus illumination system hardware that generates a discrete change in the discrete pupil profile.

7. The method of claim 1, further comprising iterating the selecting a discrete change to the discrete pupil profile and applying the discrete change to the discrete pupil profile.

8. The method of claim 1, wherein selecting a discrete change comprises calculating a plurality of gradients of a cost function, each of the plurality of gradients being with respect to intensity at one of a plurality of spatially discrete positions on a pupil plane.

9. The method of claim 8, wherein the plurality of spatially discrete positions are positions at which intensity can change by adjusting hardware of the lithographic projection apparatus illumination system.

10. The method of claim 8, wherein the cost function is a function of intensities at the plurality of spatially discrete positions on the pupil plane.

11. The method of claim 1, wherein selecting a discrete change comprises selecting the discrete change from a plurality of discrete changes.

12. The method of claim 11, wherein at least one discrete change in the plurality of discrete changes is a discrete change in intensity at one or more discrete positions of the discrete pupil profile.

13. The method of claim 11, wherein the plurality of discrete changes exclusively include those discrete changes that maintain a total intensity in the discrete pupil profile.

14. The method of claim 11, wherein the plurality of discrete changes exclusively include those discrete changes that decrease a fill ratio of the discrete pupil profile.

15. The method of claim 11, wherein the plurality of discrete changes includes a discrete change having a symmetry about an optical axis of the lithographic projection apparatus for the lithographic projection apparatus illumination system.

16. The method of claim 11, wherein selecting a discrete change further comprises calculating a change in a value of a cost function for each of the plurality of discrete changes.

17. The method of claim 1, wherein the desired pupil profile is a pupil profile of an illumination system of the lithographic projection apparatus, or is a pupil profile of projection optics of the lithographic projection apparatus.

18. The method of claim 1, wherein the desired pupil profile is a pupil profile from another lithographic projection apparatus than the lithographic projection apparatus for the lithographic projection apparatus illumination system.

19. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, when executed by a computer system, configured to at least:

generate an initial discrete pupil profile from a desired non-discrete pupil profile designed for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus;

select a discrete change to the discrete pupil profile;

apply the selected discrete change to the discrete pupil profile; and

generate electronic instructions, based on the discrete profile to which the selected discrete change has been applied, for use in configuring an optical component of, or for, a lithographic projection apparatus illumination system.

20. A method comprising:

executing, on a hardware processor of a computer system, one or more computer program modules that cause;

generation, by the computer system, of an initial discrete pupil profile from a desired non-discrete pupil profile designed for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus,

selection, using the computer system, of a discrete change to the discrete pupil profile, and

application, by the computer system, of the selected discrete change to the discrete pupil profile; and

displaying, on an electronic display communicatively linked with the processor of the computer system, the discrete pupil profile.

21. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, when executed by a computer system, configured to at least:

generate an initial discrete pupil profile from a desired non-discrete pupil profile designed for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus;

select a discrete change to the discrete pupil profile;

apply the selected discrete change to the discrete pupil profile; and

display, on an electronic display communicatively linked with the computer system, the discrete pupil profile to which the selected discrete change has been applied.