Lithographic apparatus and device manufacturing method

• US 10,191,389 B2
• Filed: 07/18/2017
• Issued: 01/29/2019
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US15/653,435
• Publication Number:
  US 20170343904A1
• Time in Patent Office: 560 Days
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Claims

1. A device manufacturing method comprising:

projecting, with a projection system, a patterned beam of radiation onto a target portion of a substrate held by a substrate table, said substrate table including

an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, and

a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, said hydrophobic layer arranged to face an opposite side of said edge seal member to said projection system and to face an opposite side of said at least one of said substrate and said object to said projection system, and

providing a liquid, through which said patterned beam of radiation is projected, to a space between said projection system and said substrate, said object, or both.

2. The method of claim 1, wherein said hydrophobic layer has a contact angle of greater than 90°

with said liquid.

3. The method of claim 1, wherein the hydrophobic layer is in contact with the opposite side of the edge seal member.

4. The method of claim 1, wherein the hydrophobic layer is out of contact with the opposite side of the at least one of said substrate and said object when the at least one of said substrate and said object is positioned on the substrate table.

5. The method of claim 4, wherein a gap between the hydrophobic layer and the opposite side of the at least one of said substrate and said object is about 10 μ

m.

6. The method of claim 1, wherein the hydrophobic layer is made of an inorganic material.

7. The method of claim 1, wherein the hydrophobic layer is made of Teflon or silicon rubber.

8. The method of claim 1, wherein the edge seal member is configured to provide a primary surface facing said projection system substantially co-planar with a primary surface of said at least one of said substrate and said object.

9. The method of claim 1, wherein providing said liquid includes providing said liquid to a localized area of at least one of said object, said edge seal member and said substrate.

10. The method of claim 1, wherein the edge seal member is an integral part of the substrate table.

11. The method of claim 1, further comprising moving the edge seal member relative to the substrate table.

12. A device manufacturing method comprising:

providing a liquid, using a liquid supply system, in a space between a projection system and a substrate supported on a substrate table, the substrate table comprising an edge seal member at least partly surrounding an edge of the substrate, an object positioned on the substrate table, or both;

repelling liquid entering a gap between said edge seal member and the substrate, the object or both using a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, and

projecting a patterned beam, using the projection system and through the liquid, onto a target portion of the substrate supported on the substrate table.

13. The method of claim 12, wherein said hydrophobic layer is arranged to face an opposite side of said edge seal member to said projection system and to face an opposite side of said at least one of said substrate and said object to said projection system.

14. The method of claim 13, wherein the hydrophobic layer is in contact with the opposite side of the edge seal member.

15. The method of claim 13, wherein the hydrophobic layer is out of contact with the opposite side of the at least one of said substrate and said object when the at least one of said substrate and said object is positioned on the substrate table.

16. The method of claim 15, wherein a gap between the hydrophobic layer and the opposite side of the at least one of said substrate and said object is about 10 μ

m.

17. The method of claim 12, wherein said hydrophobic layer has a contact angle of greater than 90°

with said liquid.

18. The method of claim 12, wherein the hydrophobic layer is made of an inorganic material.

19. The method of claim 12, wherein the hydrophobic layer is made of Teflon or silicon rubber.

20. The method of claim 12, wherein the edge seal member is configured to provide a primary surface facing said projection system substantially co-planar with a primary surface of said at least one of said substrate and said object.