Methods of fabricating contacts for cylindrical devices
First Claim
1. A method of forming a contact, comprising:
- at an annular device composed of a core and a plurality of layers that surround the core in succession, the plurality of layers including a first layer and a second layer, wherein the core and the second layer are separated by the first layer;
depositing a coating on a surface of the annular device, the surface including the core and the plurality of layers;
determining relative heights of the core, the first layer, and the second layer;
in accordance with a determination that the second layer has the largest relative height;
performing a first removal of the coating to expose the second layer;
depositing a first metal on the second layer;
performing a second removal of the coating to expose the core; and
depositing a second metal on the core;
in accordance with a determination that the core has the largest relative height;
etching a portion of the coating to expose the core; and
forming a first terminal by depositing a conductive material, wherein the conductive material contacts the exposed core and the first input terminal extends radially outward from the annular device.
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Accused Products
Abstract
A device having two transistors with dual thresholds, and a method of fabricating the device, including fabricating a silicide source, a conductive layer, and contacts to a plurality of layers of the device, is provided. The device has a core and a plurality of layers that surround the core in succession, including a first layer, a second layer, a third layer, and a fourth layer. The device further comprises a first input terminal coupled to the core, the first input terminal being configured to receive a first voltage and a second input terminal coupled to the fourth layer, the second input terminal being configured to receive a second voltage. The device comprises a common source terminal coupled to the core and the fourth layer. A memory device, such as an MTJ, may be coupled to the device.
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Citations
15 Claims
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1. A method of forming a contact, comprising:
at an annular device composed of a core and a plurality of layers that surround the core in succession, the plurality of layers including a first layer and a second layer, wherein the core and the second layer are separated by the first layer; depositing a coating on a surface of the annular device, the surface including the core and the plurality of layers; determining relative heights of the core, the first layer, and the second layer; in accordance with a determination that the second layer has the largest relative height; performing a first removal of the coating to expose the second layer; depositing a first metal on the second layer; performing a second removal of the coating to expose the core; and depositing a second metal on the core; in accordance with a determination that the core has the largest relative height; etching a portion of the coating to expose the core; and forming a first terminal by depositing a conductive material, wherein the conductive material contacts the exposed core and the first input terminal extends radially outward from the annular device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
Specification