Metal-dielectric optical filter, sensor device, and fabrication method
First Claim
Patent Images
1. An optical filter, disposed on a substrate, comprising:
- a plurality of dielectric layers; and
a plurality of metal layers,wherein each metal layer of the plurality of metal layers is stacked in alternation with at least two of the plurality of dielectric layers and is surrounded by at least two of the plurality of dielectric layers,wherein each metal layer of the plurality of metal layers has a first tapered edge and a second tapered edge that are protectively covered by at least one of the plurality of dielectric layers,wherein the first tapered edge is located at a first periphery of the optical filter and the second tapered edge is located at a second periphery of the optical filter, andwherein the plurality of metal layers are not adjacent, with respect to a length of the substrate, to any other metal layer.
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Abstract
An optical filter, a sensor device including the optical filter, and a method of fabricating the optical filter are provided. The optical filter includes one or more dielectric layers and one or more metal layers stacked in alternation. The metal layers are intrinsically protected by the dielectric layers. In particular, the metal layers have tapered edges that are protectively covered by one or more of the dielectric layers.
58 Citations
31 Claims
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1. An optical filter, disposed on a substrate, comprising:
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a plurality of dielectric layers; and a plurality of metal layers, wherein each metal layer of the plurality of metal layers is stacked in alternation with at least two of the plurality of dielectric layers and is surrounded by at least two of the plurality of dielectric layers, wherein each metal layer of the plurality of metal layers has a first tapered edge and a second tapered edge that are protectively covered by at least one of the plurality of dielectric layers, wherein the first tapered edge is located at a first periphery of the optical filter and the second tapered edge is located at a second periphery of the optical filter, and wherein the plurality of metal layers are not adjacent, with respect to a length of the substrate, to any other metal layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A sensor device comprising:
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one or more first sensor elements; and one or more first optical filters disposed over the one or more first sensor elements, wherein each of the one or more first optical filters includes; a plurality of dielectric layers; and a plurality of metal layers, wherein each metal layer of the plurality of metal layers is stacked in alternation with at least two of the plurality of dielectric layers and is surrounded by at least two of the plurality of dielectric layers, wherein each metal layer of the plurality of metal layers has a first tapered edge and a second tapered edge that are protectively covered by at least one of the plurality of dielectric layers, wherein the first tapered edge is located at a first periphery of each first optical filter, of the of the one or more first optical filters, and the second tapered edge is located at a second periphery of each first optical filter of the one or more first optical filters, and wherein the plurality of metal layers are not adjacent, with respect to a length of a substrate, to any other metal layer. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method of fabricating an optical filter, the method comprising:
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providing a substrate; applying a photoresist layer onto the substrate; patterning the photoresist layer to uncover a filter region of the substrate, whereby an overhang is formed in the patterned photoresist layer surrounding the filter region; depositing a multilayer stack, including a plurality of metal layers stacked in alternation with a plurality of dielectric layers, onto the patterned photoresist layer and the filter region of the substrate, wherein each metal layer of the plurality of metal layers is stacked in alternation with at least two of the plurality of dielectric layers and is surrounded by at least two of the plurality of dielectric layers; and removing the patterned photoresist layer and a first portion of the multilayer stack on the patterned photoresist layer so that a second portion of the multilayer stack remaining on the filter region of the substrate forms the optical filter, wherein each metal layer of the plurality of metal layers in the optical filter has a first tapered edge and a second tapered edge that are protectively covered by at least one of the plurality of dielectric layers in the optical filter, wherein the first tapered edge is located at a first periphery of the optical filter and the second tapered edge is located at a second periphery of the optical filter, and wherein the plurality of metal layers are not adjacent, with respect to a length of the substrate, to any other metal layer. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31)
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Specification