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Methods for in situ monitoring and control of defect formation or healing

  • US 10,203,295 B2
  • Filed: 04/14/2016
  • Issued: 02/12/2019
  • Est. Priority Date: 04/14/2016
  • Status: Expired due to Fees
First Claim
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1. A method for monitoring defect formation or healing, comprising:

  • exposing a surface of a material to incident radiation, the material being a two-dimensional material including a graphene or graphene-based film;

    detecting scattered, emitted and/or transmitted radiation from at least a portion of the material exposed to the incident radiation; and

    generating data indicative of defect formation or healing, wherein the method is performed in situ where the defect formation or healing occurs and the data indicative of defect formation or healing provide a rate of defect formation or healing, a temporal change in the rate of defect formation or healing, a temporal change in the size of the defects, a spatial change in the rate of defect formation or healing, a spatial change in the size of the defects, or combinations thereof.

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